Space charge formation under dc conditions and its influence on electric stress profile after voltage reversal in XLPE cable
Space charge formation under dc conditions and its influence on electric stress profile after voltage reversal in XLPE cable
The paper presents the space charge evolution in a cross-linked polyethylene (XLPE) power cable under dc stress and its influence on the electric stress distribution after the voltage reversal. Due to the relatively high stability of the space charge formed in previous voltage polarity, the electric stress profile across the insulation was severely distorted during the voltage reversal process.
7-900371-56-7
156-159
Fu, M
22d474b8-9c19-4ccb-9e64-6087ffe0941d
Chen, G
3de45a9c-6c9a-4bcb-90c3-d7e26be21819
2003
Fu, M
22d474b8-9c19-4ccb-9e64-6087ffe0941d
Chen, G
3de45a9c-6c9a-4bcb-90c3-d7e26be21819
Fu, M and Chen, G
(2003)
Space charge formation under dc conditions and its influence on electric stress profile after voltage reversal in XLPE cable.
The 2nd International Conference on Insulation Condition Mornitoring of Electrical Plant, Chongqing, China.
27 - 30 Oct 2003.
.
Record type:
Conference or Workshop Item
(Other)
Abstract
The paper presents the space charge evolution in a cross-linked polyethylene (XLPE) power cable under dc stress and its influence on the electric stress distribution after the voltage reversal. Due to the relatively high stability of the space charge formed in previous voltage polarity, the electric stress profile across the insulation was severely distorted during the voltage reversal process.
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Published date: 2003
Additional Information:
Event Dates: October 27-30
Venue - Dates:
The 2nd International Conference on Insulation Condition Mornitoring of Electrical Plant, Chongqing, China, 2003-10-27 - 2003-10-30
Organisations:
Electronics & Computer Science, EEE
Identifiers
Local EPrints ID: 258519
URI: http://eprints.soton.ac.uk/id/eprint/258519
ISBN: 7-900371-56-7
PURE UUID: b978ba57-20bf-418d-85ad-7cb221dc79eb
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Date deposited: 10 Nov 2003
Last modified: 10 Dec 2021 20:56
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Contributors
Author:
M Fu
Author:
G Chen
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