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Etching Techniques for the realisation optical micro-cavities on silicon for atom traps

Etching Techniques for the realisation optical micro-cavities on silicon for atom traps
Etching Techniques for the realisation optical micro-cavities on silicon for atom traps
We present work focused on the realization of silicon based optical microcavities on silicon. We expect to be able to form "open" cavities between spherical mirrors etched into the silicon and flat mirros placed at the end of a polished optical fibres. By using appropriate isotropic chemical etching technology, spherical mirror can be etched into the silicon, but it is important to minimize surface roughness while maintaining the optimum surface tophography. Two different techniques are used for the fabrication of the spherical mirror: the first is based around the use of a silicon oxide mask, the second uses indentation of the silicon surface using dry etching followed bu wet osptropic etching.
90-808266-1-8
139-142
Moktadir, Z
9e14f4f9-7314-4a39-9776-473806c75dd4
Koukharenko, E
b34ae878-2776-4088-8880-5b2bd4f33ec3
Kraft, M
54927621-738f-4d40-af56-a027f686b59f
Bagnall, D M
5d84abc8-77e5-43f7-97cb-e28533f25ef1
Jones, M
7ffd3f08-1eaa-4386-b4fa-445a22c085b7
Powell, H
1c35d5a8-7955-41eb-8311-fb24ceaa4895
Hinds, E
19eecd8c-a0b1-4856-939b-e21cbe3060c6
Moktadir, Z
9e14f4f9-7314-4a39-9776-473806c75dd4
Koukharenko, E
b34ae878-2776-4088-8880-5b2bd4f33ec3
Kraft, M
54927621-738f-4d40-af56-a027f686b59f
Bagnall, D M
5d84abc8-77e5-43f7-97cb-e28533f25ef1
Jones, M
7ffd3f08-1eaa-4386-b4fa-445a22c085b7
Powell, H
1c35d5a8-7955-41eb-8311-fb24ceaa4895
Hinds, E
19eecd8c-a0b1-4856-939b-e21cbe3060c6

Moktadir, Z, Koukharenko, E, Kraft, M, Bagnall, D M, Jones, M, Powell, H and Hinds, E (2003) Etching Techniques for the realisation optical micro-cavities on silicon for atom traps. 14th Micromechanics Europe Workshop, Delft, The, Netherlands. 02 - 04 Nov 2003. pp. 139-142 .

Record type: Conference or Workshop Item (Poster)

Abstract

We present work focused on the realization of silicon based optical microcavities on silicon. We expect to be able to form "open" cavities between spherical mirrors etched into the silicon and flat mirros placed at the end of a polished optical fibres. By using appropriate isotropic chemical etching technology, spherical mirror can be etched into the silicon, but it is important to minimize surface roughness while maintaining the optimum surface tophography. Two different techniques are used for the fabrication of the spherical mirror: the first is based around the use of a silicon oxide mask, the second uses indentation of the silicon surface using dry etching followed bu wet osptropic etching.

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More information

Published date: 2003
Additional Information: Event Dates: 2-4th November 2003
Venue - Dates: 14th Micromechanics Europe Workshop, Delft, The, Netherlands, 2003-11-02 - 2003-11-04
Organisations: Nanoelectronics and Nanotechnology, EEE

Identifiers

Local EPrints ID: 258599
URI: http://eprints.soton.ac.uk/id/eprint/258599
ISBN: 90-808266-1-8
PURE UUID: 2083ba6a-1910-4488-a361-abf0e5b29120

Catalogue record

Date deposited: 24 Nov 2003
Last modified: 29 Jan 2020 15:32

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Contributors

Author: Z Moktadir
Author: E Koukharenko
Author: M Kraft
Author: D M Bagnall
Author: M Jones
Author: H Powell
Author: E Hinds

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