Ultra low silicon substrate noise crosstalk using metal Faraday cages in a silicon-on-insulator technology.


Stefanou, S, Hamel, J, Baine, P, Armstrong, M, Gamble, H, Kraft, M and Kemhadjian, H A (2004) Ultra low silicon substrate noise crosstalk using metal Faraday cages in a silicon-on-insulator technology. IEEE Transactions on Electron Devices, 51 No., pp. 486-491.

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Item Type: Article
Organisations: Nanoelectronics and Nanotechnology
ePrint ID: 259082
Date :
Date Event
March 2004Published
Date Deposited: 27 Sep 2004
Last Modified: 17 Apr 2017 22:33
Further Information:Google Scholar
URI: http://eprints.soton.ac.uk/id/eprint/259082

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