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Integration of a two-dimensional electrostatic actuator in a new generation of atom chips

Gollasch, C O, Moktadir, Zak, Koukharenko, Elena, Kraft, Michael, Bagnall, Darren, Eriksson, S, Trupke, M and Hinds, E A (2004) Integration of a two-dimensional electrostatic actuator in a new generation of atom chips At Eurosensors XVIII, Italy. 13 - 15 Sep 2004.

Record type: Conference or Workshop Item (Paper)

Abstract

Summary: In this paper we present an integrated atom chip design which incorporates a micromachined electrostatic actuator for optical cavity alignment. The two-dimensional actuator is fabricated by applying deep reactive ion etching techniques (DRIE) on a silicon-on-glass wafer. An actution of 17.5 um is achievable which is sufficient to compensate for the misalignment of the optical cavity during the fabrication process.

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More information

Published date: 2004
Additional Information: Event Dates: 13 - 15 September 2004
Venue - Dates: Eurosensors XVIII, Italy, 2004-09-13 - 2004-09-15
Keywords: atom chip, actuator, electrostatic
Organisations: Nanoelectronics and Nanotechnology, EEE

Identifiers

Local EPrints ID: 259987
URI: http://eprints.soton.ac.uk/id/eprint/259987
PURE UUID: 58535e2e-14b7-4f03-8d7b-3cc968f2f9d5

Catalogue record

Date deposited: 10 Feb 2005
Last modified: 18 Jul 2017 09:17

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Contributors

Author: C O Gollasch
Author: Zak Moktadir
Author: Elena Koukharenko
Author: Michael Kraft
Author: Darren Bagnall
Author: S Eriksson
Author: M Trupke
Author: E A Hinds

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