El Mubarek, H A W, Wang, Y, Bonar, J M, Hemment, P L F and Ashburn, P (2004) Effect of Fluorine Implantation on Boron Diffusion in Metastable Si0.86Ge0.14. Material Research Society Symposium C Proceedings, MRS Spring Meeting, San Francisco.
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Published date: April 2004
Organisations:
Nanoelectronics and Nanotechnology
Identifiers
Local EPrints ID: 260246
URI: http://eprints.soton.ac.uk/id/eprint/260246
PURE UUID: fac6d2d9-c317-4d58-8abf-db6af5747b86
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Date deposited: 14 Apr 2005
Last modified: 08 Jan 2022 05:45
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Contributors
Author:
H A W El Mubarek
Author:
Y Wang
Author:
J M Bonar
Author:
P L F Hemment
Author:
P Ashburn
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