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Optimization of alloy composition for high-performance strained-Si-SiGeN-channel MOSFETs

Olsen, S.H., O'Neill, A.G., Driscoll, L.S., Chattopadhyay, S., Kwa, K.s.K., Waite, A., Tang, Y.T., Evans, A.G.R. and Zhang, J. (2004) Optimization of alloy composition for high-performance strained-Si-SiGeN-channel MOSFETs IEEE Transactions on Elect Devices, 51, (7), pp. 1156-1163.

Record type: Article

Abstract

Abstract—On-state and off-state performance of strained- Si–SiGe n-channel MOSFETs have been investigated as a function of SiGe virtual substrate alloy composition. Performance gains in terms of on-state drain current and maximum transconductance of up to 220% are demonstrated for strained-Si–SiGe devices compared with Si controls. Device performance is found to peak using a virtual substrate composition of Si0 75Ge0 25. MOSFET fabrication used high thermal budget processing and good gate oxide quality has been maintained for virtual substrates having Ge compositions up to 30%. Off-state characteristics are found to be more sensitive to strain relaxation than on-state characteristics. Index Terms—Drain current enhancement, mobility enhancement, n-MOSFETs, silicon-germanium (SiGe), strained-Silicon, thermal budget, transconductance enhancement, virtual substrate.

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Published date: July 2004
Organisations: Nanoelectronics and Nanotechnology

Identifiers

Local EPrints ID: 260261
URI: http://eprints.soton.ac.uk/id/eprint/260261
PURE UUID: 03e3bc72-388a-473a-87b4-02c2107d71e9

Catalogue record

Date deposited: 18 Jan 2005
Last modified: 18 Jul 2017 09:14

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Contributors

Author: S.H. Olsen
Author: A.G. O'Neill
Author: L.S. Driscoll
Author: S. Chattopadhyay
Author: K.s.K. Kwa
Author: A. Waite
Author: Y.T. Tang
Author: A.G.R. Evans
Author: J. Zhang

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