Novel fabrication methods for submicrometer Josephson junction qubits.


Potts, A, Routley, P R, Parker, G J and de Groot, P A J (2001) Novel fabrication methods for submicrometer Josephson junction qubits. Journal of Materials Science : Materials in Electronics, (12), pp. 289-293.

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Description/Abstract

Novel processes for the fabrication of mesoscopic Josephson junction qubits have been developed, based on superconducting Al/Al203/Al tunnel junctions. These are fabricated by electron beam lithography using single-layer and multi-layer resists, and standard processes that are compatible with conventional CMOS processing. The new single-layer resist process is found to have significant advantages over conventional fabrication methods using suspended tri-layer masks

Item Type: Article
Organisations: Nanoelectronics and Nanotechnology
ePrint ID: 260364
Date :
Date Event
June 2001Published
Date Deposited: 25 Jan 2005
Last Modified: 17 Apr 2017 22:14
Further Information:Google Scholar
URI: http://eprints.soton.ac.uk/id/eprint/260364

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