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Novel fabrication methods for submicrometer Josephson junction qubits

Record type: Article

Novel processes for the fabrication of mesoscopic Josephson junction qubits have been developed, based on superconducting Al/Al2O3/Al tunnel junctions. These are fabricated by electron beam lithography using single-layer and multi-layer resists, and standard processes that are compatible with conventional CMOS processing. The new single-layer resist process is found to have significant advantages over conventional fabrication methods using suspended tri-layer shadow masks.

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Citation

Potts, A., Routley, P.R., Parker, Gregory J. and de Groot, Peter A. J. (2001) Novel fabrication methods for submicrometer Josephson junction qubits Journal of Materials Science: Materials in Electronics, 12, (4-6), pp. 289-293. (doi:10.1023/A:1011279908265).

More information

Published date: June 2001
Organisations: Nanoelectronics and Nanotechnology

Identifiers

Local EPrints ID: 260364
URI: http://eprints.soton.ac.uk/id/eprint/260364
PURE UUID: 3f9ea64a-e7ab-4176-8262-27cb5e4ff34b

Catalogue record

Date deposited: 25 Jan 2005
Last modified: 24 Jul 2017 16:41

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Contributors

Author: A. Potts
Author: P.R. Routley
Author: Gregory J. Parker
Author: Peter A. J. de Groot

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