Potts, A, Routley, P R, Parker, G J and de Groot, P A J
Novel fabrication methods for submicrometer Josephson junction qubits.
Journal of Materials Science : Materials in Electronics, (12), .
Novel processes for the fabrication of mesoscopic Josephson junction qubits have been developed, based on superconducting Al/Al203/Al tunnel junctions. These are fabricated by electron beam lithography using single-layer and multi-layer resists, and standard processes that are compatible with conventional CMOS processing. The new single-layer resist process is found to have significant advantages over conventional fabrication methods using suspended tri-layer masks
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