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Novel fabrication methods for submicrometer Josephson junction qubits

Potts, A., Routley, P.R., Parker, Gregory J. and de Groot, Peter A. J. (2001) Novel fabrication methods for submicrometer Josephson junction qubits Journal of Materials Science: Materials in Electronics, 12, (4-6), pp. 289-293. (doi:10.1023/A:1011279908265).

Record type: Article


Novel processes for the fabrication of mesoscopic Josephson junction qubits have been developed, based on superconducting Al/Al2O3/Al tunnel junctions. These are fabricated by electron beam lithography using single-layer and multi-layer resists, and standard processes that are compatible with conventional CMOS processing. The new single-layer resist process is found to have significant advantages over conventional fabrication methods using suspended tri-layer shadow masks.

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Published date: June 2001
Organisations: Nanoelectronics and Nanotechnology


Local EPrints ID: 260364
PURE UUID: 3f9ea64a-e7ab-4176-8262-27cb5e4ff34b

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Date deposited: 25 Jan 2005
Last modified: 24 Jul 2017 16:41

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Author: A. Potts
Author: P.R. Routley
Author: Gregory J. Parker
Author: Peter A. J. de Groot

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