Elejalde, N., Grigore, L., Ensell, G.J., Evans, A.G.R., Lee, S.L. and Ogrin, F.Y. (2001) Positive and Negative Photoresist as Thick Moulds for Electroplating High Aspect Ratio 3D Structures. Micromechanics Europe 2001, NMRC, Cork, Ireland. 03 - 05 Oct 2001.
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Conference or Workshop Item
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Published date: 2001
Additional Information:
Event Dates: 4th-6th October 2001
Venue - Dates:
Micromechanics Europe 2001, NMRC, Cork, Ireland, 2001-10-03 - 2001-10-05
Organisations:
Nanoelectronics and Nanotechnology
Identifiers
Local EPrints ID: 260451
URI: http://eprints.soton.ac.uk/id/eprint/260451
PURE UUID: 0195673e-ad5d-4bac-90f3-4439beb1f748
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Date deposited: 07 Feb 2005
Last modified: 10 Dec 2021 21:11
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Contributors
Author:
N. Elejalde
Author:
L. Grigore
Author:
G.J. Ensell
Author:
A.G.R. Evans
Author:
S.L. Lee
Author:
F.Y. Ogrin
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