The University of Southampton
University of Southampton Institutional Repository

Positive and Negative Photoresist as Thick Moulds for Electroplating High Aspect Ratio 3D Structures

Record type: Conference or Workshop Item (Other)

Full text not available from this repository.

Citation

Elejalde, N., Grigore, L., Ensell, G.J., Evans, A.G.R., Lee, S.L. and Ogrin, F.Y. (2001) Positive and Negative Photoresist as Thick Moulds for Electroplating High Aspect Ratio 3D Structures At Micromechanics Europe 2001. 04 - 06 Oct 2001.

More information

Published date: 2001
Additional Information: Event Dates: 4th-6th October 2001
Venue - Dates: Micromechanics Europe 2001, 2001-10-04 - 2001-10-06
Organisations: Nanoelectronics and Nanotechnology

Identifiers

Local EPrints ID: 260451
URI: http://eprints.soton.ac.uk/id/eprint/260451
PURE UUID: 0195673e-ad5d-4bac-90f3-4439beb1f748

Catalogue record

Date deposited: 07 Feb 2005
Last modified: 18 Jul 2017 09:12

Export record

Contributors

Author: N. Elejalde
Author: L. Grigore
Author: G.J. Ensell
Author: A.G.R. Evans
Author: S.L. Lee
Author: F.Y. Ogrin

University divisions


Download statistics

Downloads from ePrints over the past year. Other digital versions may also be available to download e.g. from the publisher's website.

View more statistics

Atom RSS 1.0 RSS 2.0

Contact ePrints Soton: eprints@soton.ac.uk

ePrints Soton supports OAI 2.0 with a base URL of http://eprints.soton.ac.uk/cgi/oai2

This repository has been built using EPrints software, developed at the University of Southampton, but available to everyone to use.

We use cookies to ensure that we give you the best experience on our website. If you continue without changing your settings, we will assume that you are happy to receive cookies on the University of Southampton website.

×