El Mubarek, H.A.W., Bonar, J.M. and Ashburn, P. (2004) Reduction of boron transient enhanced diffusion in silicon and silicon-germanium by fluorine implantation. Technology and Device Meeting 2004, , Frankfurt, Germany. 15 - 18 May 2004.
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Published date: May 2004
Venue - Dates:
Technology and Device Meeting 2004, , Frankfurt, Germany, 2004-05-15 - 2004-05-18
Organisations:
Nanoelectronics and Nanotechnology
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Local EPrints ID: 260756
URI: http://eprints.soton.ac.uk/id/eprint/260756
PURE UUID: 01deb10d-7b00-43e5-96fc-cf1bd4588b00
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Date deposited: 14 Apr 2005
Last modified: 12 Dec 2021 01:57
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