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Reduction of boron transient enhanced diffusion in silicon and silicon-germanium by fluorine implantation

Reduction of boron transient enhanced diffusion in silicon and silicon-germanium by fluorine implantation
Reduction of boron transient enhanced diffusion in silicon and silicon-germanium by fluorine implantation
El Mubarek, H A W
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Bonar, J M
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Ashburn, P
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El Mubarek, H A W, Bonar, J M and Ashburn, P (2004) Reduction of boron transient enhanced diffusion in silicon and silicon-germanium by fluorine implantation Technology and Device Meeting (ISTDM), Frankfurt Oder, Germany

El Mubarek, H A W, Bonar, J M and Ashburn, P (2004) Reduction of boron transient enhanced diffusion in silicon and silicon-germanium by fluorine implantation Technology and Device Meeting (ISTDM), Frankfurt Oder, Germany

Record type: Article

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Published date: May 2004
Organisations: Nanoelectronics and Nanotechnology

Identifiers

Local EPrints ID: 260756
URI: http://eprints.soton.ac.uk/id/eprint/260756
PURE UUID: 01deb10d-7b00-43e5-96fc-cf1bd4588b00

Catalogue record

Date deposited: 14 Apr 2005
Last modified: 18 Jul 2017 09:09

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Contributors

Author: H A W El Mubarek
Author: J M Bonar
Author: P Ashburn

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