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Diffusion in SiGe: defect injection studies on Sb, As and B

Diffusion in SiGe: defect injection studies on Sb, As and B
Diffusion in SiGe: defect injection studies on Sb, As and B
Bonar, J M
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Uppal, S
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Karunaratne, M S A
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Willoughby, A F
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Ashburn, P
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Bonar, J M
5ee6b25a-3e67-4a6d-9854-5e1e079d50b8
Uppal, S
d67df8ab-cae8-4474-86ac-de9373953ec6
Karunaratne, M S A
170fefcd-474c-4641-8389-2d886766feb0
Willoughby, A F
4cfa50bd-a80a-4aea-80be-0c478b04525f
Ashburn, P
68cef6b7-205b-47aa-9efb-f1f09f5c1038

Bonar, J M, Uppal, S, Karunaratne, M S A, Willoughby, A F and Ashburn, P (2004) Diffusion in SiGe: defect injection studies on Sb, As and B. Electrochemical Soc. Meeting: SiGe Materials, Processing and Devices, Honolulu.

Record type: Article

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More information

Published date: October 2004
Organisations: Nanoelectronics and Nanotechnology

Identifiers

Local EPrints ID: 260757
URI: http://eprints.soton.ac.uk/id/eprint/260757
PURE UUID: 521d4137-9e0e-494e-ad91-14b4828ca16b

Catalogue record

Date deposited: 14 Apr 2005
Last modified: 16 Jul 2019 22:49

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Contributors

Author: J M Bonar
Author: S Uppal
Author: M S A Karunaratne
Author: A F Willoughby
Author: P Ashburn

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