Further advances in applying continuum design sensitivity analysis in combination with commercial electromagnetic software to aid design optimization


Kim, Dong-Hun, Sykulski, J.K., Lowther, D., Choi, Jong-Woo and Kim, Tae-Young (2005) Further advances in applying continuum design sensitivity analysis in combination with commercial electromagnetic software to aid design optimization At COMPUMAG, China. 26 - 30 Jun 2005. , pp. 184-185.

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Item Type: Conference or Workshop Item (Paper)
Additional Information: Event Dates: 26-30 June 2005
Venue - Dates: COMPUMAG, China, 2005-06-26 - 2005-06-30
Organisations: EEE
ePrint ID: 261047
Date :
Date Event
2005Published
Date Deposited: 06 Jul 2005
Last Modified: 17 Apr 2017 22:03
Further Information:Google Scholar
URI: http://eprints.soton.ac.uk/id/eprint/261047

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