Kim, Dong-Hun, Sykulski, J.K., Lowther, D., Choi, Jong-Woo and Kim, Tae-Young (2005) Further advances in applying continuum design sensitivity analysis in combination with commercial electromagnetic software to aid design optimization. COMPUMAG, Shenyang, China. 26 - 30 Jun 2005. pp. 184-185 .
Record type:
Conference or Workshop Item
(Paper)
More information
Published date: 2005
Additional Information:
Event Dates: 26-30 June 2005
Venue - Dates:
COMPUMAG, Shenyang, China, 2005-06-26 - 2005-06-30
Organisations:
EEE
Identifiers
Local EPrints ID: 261047
URI: http://eprints.soton.ac.uk/id/eprint/261047
PURE UUID: 4f8bd4bf-8805-48d2-af2a-38b8d532e9be
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Date deposited: 06 Jul 2005
Last modified: 15 Mar 2024 02:34
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Contributors
Author:
Dong-Hun Kim
Author:
J.K. Sykulski
Author:
D. Lowther
Author:
Jong-Woo Choi
Author:
Tae-Young Kim
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