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Further advances in applying continuum design sensitivity analysis in combination with commercial electromagnetic software to aid design optimization

Record type: Conference or Workshop Item (Paper)
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Citation

Kim, Dong-Hun, Sykulski, J.K., Lowther, D., Choi, Jong-Woo and Kim, Tae-Young (2005) Further advances in applying continuum design sensitivity analysis in combination with commercial electromagnetic software to aid design optimization At COMPUMAG, China. 26 - 30 Jun 2005. , pp. 184-185.

More information

Published date: 2005
Additional Information: Event Dates: 26-30 June 2005
Venue - Dates: COMPUMAG, China, 2005-06-26 - 2005-06-30
Organisations: EEE

Identifiers

Local EPrints ID: 261047
URI: http://eprints.soton.ac.uk/id/eprint/261047
PURE UUID: 4f8bd4bf-8805-48d2-af2a-38b8d532e9be
ORCID for J.K. Sykulski: ORCID iD orcid.org/0000-0001-6392-126X

Catalogue record

Date deposited: 06 Jul 2005
Last modified: 18 Jul 2017 09:06

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Contributors

Author: Dong-Hun Kim
Author: J.K. Sykulski ORCID iD
Author: D. Lowther
Author: Jong-Woo Choi
Author: Tae-Young Kim

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