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A comparative study of different thick photoresists for MEMS applications

A comparative study of different thick photoresists for MEMS applications
A comparative study of different thick photoresists for MEMS applications
741-747
Koukharenko, E.
9fdec80f-f22b-415f-ba9b-3b6b854b37a8
Kraft, M.
a016b47e-641a-40b5-b77a-9101369e63b9
Ensell, G.
48fe0996-1c6b-4816-8bd0-0a3234d36ae8
Hollinshead, N.
8bd68515-ed1a-4f85-8bdd-a0f5c0ad65b9
Koukharenko, E.
9fdec80f-f22b-415f-ba9b-3b6b854b37a8
Kraft, M.
a016b47e-641a-40b5-b77a-9101369e63b9
Ensell, G.
48fe0996-1c6b-4816-8bd0-0a3234d36ae8
Hollinshead, N.
8bd68515-ed1a-4f85-8bdd-a0f5c0ad65b9

Koukharenko, E., Kraft, M., Ensell, G. and Hollinshead, N. (2005) A comparative study of different thick photoresists for MEMS applications. Journal of Materials Science: Materials in Electronics, 16 (11-12), 741-747.

Record type: Article

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More information

Published date: November 2005
Organisations: Nanoelectronics and Nanotechnology

Identifiers

Local EPrints ID: 261723
URI: https://eprints.soton.ac.uk/id/eprint/261723
PURE UUID: a442b8c2-ce19-4ea9-9982-d8df4718cfb1

Catalogue record

Date deposited: 22 Dec 2005
Last modified: 16 Jul 2019 22:47

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