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Planar chiral meta-materials for optical applications

Planar chiral meta-materials for optical applications
Planar chiral meta-materials for optical applications
Room temperature nanoimprint lithography has successfully been applied to the fabrication of planar chiral photonic meta-materials. For dielectric chiral structures a single layer of thick HSQ was used while for metallic chiral structures a bi-layer technique using PMMA/hydrogen silsequioxane (HSQ) was applied. The polarization conversion capabilities of planar chiral structures imprinted in dielectric materials have experimentally been observed. This indicates that the developed processes in this work have the prospect of manufacturing planar photonic meta media in high volume at low cost.
Room temperature nanoimprint lithography, Electron beam lithography, Reactive ion etch, Planar chiral structures, Optical activity, LOR, PMMA, Hydrogen silsequioxane
0167-9317
367-371
Potts, A.
60d57f4c-abcf-4b6b-8247-28711e6fd4d4
Papakostas, A.
31744352-e4d4-4401-9920-ed286320190d
Bagnall, D.M.
5d84abc8-77e5-43f7-97cb-e28533f25ef1
Zheludev, N.I.
32fb6af7-97e4-4d11-bca6-805745e40cc6
Potts, A.
60d57f4c-abcf-4b6b-8247-28711e6fd4d4
Papakostas, A.
31744352-e4d4-4401-9920-ed286320190d
Bagnall, D.M.
5d84abc8-77e5-43f7-97cb-e28533f25ef1
Zheludev, N.I.
32fb6af7-97e4-4d11-bca6-805745e40cc6

Potts, A., Papakostas, A., Bagnall, D.M. and Zheludev, N.I. (2004) Planar chiral meta-materials for optical applications. Microelectronic Engineering, 73-74, 367-371. (doi:10.1016/j.mee.2004.02.067).

Record type: Article

Abstract

Room temperature nanoimprint lithography has successfully been applied to the fabrication of planar chiral photonic meta-materials. For dielectric chiral structures a single layer of thick HSQ was used while for metallic chiral structures a bi-layer technique using PMMA/hydrogen silsequioxane (HSQ) was applied. The polarization conversion capabilities of planar chiral structures imprinted in dielectric materials have experimentally been observed. This indicates that the developed processes in this work have the prospect of manufacturing planar photonic meta media in high volume at low cost.

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More information

Published date: March 2004
Additional Information: Event Dates: September 2003
Venue - Dates: 29th International Conference on Micro and Nano Engineering, United Kingdom, 2003-09-01
Keywords: Room temperature nanoimprint lithography, Electron beam lithography, Reactive ion etch, Planar chiral structures, Optical activity, LOR, PMMA, Hydrogen silsequioxane
Organisations: Nanoelectronics and Nanotechnology

Identifiers

Local EPrints ID: 262107
URI: https://eprints.soton.ac.uk/id/eprint/262107
ISSN: 0167-9317
PURE UUID: 91725cf9-6e48-4ef6-9973-30a593aa8e60
ORCID for N.I. Zheludev: ORCID iD orcid.org/0000-0002-1013-6636

Catalogue record

Date deposited: 22 Mar 2006
Last modified: 03 Dec 2019 02:03

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Contributors

Author: A. Potts
Author: A. Papakostas
Author: D.M. Bagnall
Author: N.I. Zheludev ORCID iD

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