Effect of rapid epitaxy in-situ phosphorus-doped polysilicon emitter on current-gain of bipolar transistors
Effect of rapid epitaxy in-situ phosphorus-doped polysilicon emitter on current-gain of bipolar transistors
1281
Shiba, T
301a15ec-af81-42e2-9ea3-14d234cf1b22
Kondo, M
449d0757-0b63-491b-8631-56dd23b6e203
Uchino, T
5c7413a3-c3f6-41ee-8a74-1614054f63e4
Murakoshi, H
cacb3274-aa8d-4cea-bdcf-7d4b97a3c020
Tamaki, Y
4e1d73a1-9605-4e50-b624-041c9bf86dc0
1996
Shiba, T
301a15ec-af81-42e2-9ea3-14d234cf1b22
Kondo, M
449d0757-0b63-491b-8631-56dd23b6e203
Uchino, T
5c7413a3-c3f6-41ee-8a74-1614054f63e4
Murakoshi, H
cacb3274-aa8d-4cea-bdcf-7d4b97a3c020
Tamaki, Y
4e1d73a1-9605-4e50-b624-041c9bf86dc0
Shiba, T, Kondo, M, Uchino, T, Murakoshi, H and Tamaki, Y
(1996)
Effect of rapid epitaxy in-situ phosphorus-doped polysilicon emitter on current-gain of bipolar transistors.
IEEE Trans. Electron Devices, 43, .
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Published date: 1996
Organisations:
Nanoelectronics and Nanotechnology
Identifiers
Local EPrints ID: 262152
URI: http://eprints.soton.ac.uk/id/eprint/262152
PURE UUID: 282dd1bd-7a90-4f77-888e-e3fe72637304
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Date deposited: 27 Mar 2006
Last modified: 07 Jan 2022 21:11
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Contributors
Author:
T Shiba
Author:
M Kondo
Author:
T Uchino
Author:
H Murakoshi
Author:
Y Tamaki
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