Process and device technologies for high speed self-aligned bipolar transistors


Nakamura, T, Shiba, T, Onai, T, Uchino, T, Kiyota, Y, Washio, K and Homma, N (1995) Process and device technologies for high speed self-aligned bipolar transistors IEICE Trans. Electron, E78-C, p. 1154.

Download

Full text not available from this repository.

Item Type: Article
Organisations: Nanoelectronics and Nanotechnology
ePrint ID: 262156
Date :
Date Event
1995Published
Date Deposited: 27 Mar 2006
Last Modified: 17 Apr 2017 21:46
Further Information:Google Scholar
URI: http://eprints.soton.ac.uk/id/eprint/262156

Actions (login required)

View Item View Item