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0.1-μm CMOS with shallow and steep source/drain extensions fabricated by using rapid vapor-phase doping (RVD)

0.1-μm CMOS with shallow and steep source/drain extensions fabricated by using rapid vapor-phase doping (RVD)
0.1-μm CMOS with shallow and steep source/drain extensions fabricated by using rapid vapor-phase doping (RVD)
93
Uchino, T
5c7413a3-c3f6-41ee-8a74-1614054f63e4
Kiyota, Y
b49d469e-0ab4-4fb7-9870-bc8d93ea0b1a
Shiba, T
301a15ec-af81-42e2-9ea3-14d234cf1b22
Uchino, T
5c7413a3-c3f6-41ee-8a74-1614054f63e4
Kiyota, Y
b49d469e-0ab4-4fb7-9870-bc8d93ea0b1a
Shiba, T
301a15ec-af81-42e2-9ea3-14d234cf1b22

Uchino, T, Kiyota, Y and Shiba, T (1999) 0.1-μm CMOS with shallow and steep source/drain extensions fabricated by using rapid vapor-phase doping (RVD). In Proceedings Symposium VLSI Technology Digest, Kyoto. p. 93 .

Record type: Conference or Workshop Item (Paper)

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More information

Published date: 1999
Organisations: Nanoelectronics and Nanotechnology

Identifiers

Local EPrints ID: 262166
URI: http://eprints.soton.ac.uk/id/eprint/262166
PURE UUID: 9f939108-fc7d-4728-8a10-61318394589e

Catalogue record

Date deposited: 27 Mar 2006
Last modified: 08 Jan 2022 01:29

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Contributors

Author: T Uchino
Author: Y Kiyota
Author: T Shiba

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