Karunaratne, M.S.A., Bonar, J.M., Ashburn, P. and Willoughby, A.F.W. (2006) Suppression of boron diffusion due to carbon during rapid thermal annealing of SiGe based device materials: some comments. Journal of Materials Science, 41 (3), 1013-1016.
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Published date: March 2006
Organisations:
Nanoelectronics and Nanotechnology
Identifiers
Local EPrints ID: 262476
URI: http://eprints.soton.ac.uk/id/eprint/262476
ISSN: 0022-2461
PURE UUID: fc4cb131-0e25-4b7f-ba79-1d33fc3eaf3e
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Date deposited: 03 May 2006
Last modified: 08 Jan 2022 17:40
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Contributors
Author:
M.S.A. Karunaratne
Author:
J.M. Bonar
Author:
P. Ashburn
Author:
A.F.W. Willoughby
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