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A novel area efficient floating field limiting ring edge termination technique

Souza, M M De, Bose, J V SubhasChandra, Narayanan, E M Sankara, Pease, T J, Ensell, G J and Humphry, J (2000) A novel area efficient floating field limiting ring edge termination technique Solid State Electronics, 44, (8), pp. 1381-1386.

Record type: Article

Abstract

In this paper, a floating ring edge termination structure using minimally sized lightly doped p-rings is proposed. A novel embodiment of the structure involves placement of shallow p(+)-regions offset from the centre of each of the p-well rings to reduce peak electric field at the surface and to reduce sensitivity to oxide interface charges. The structures have been fabricated using an advanced, 2 kV MOS-bipolar process technology. A close match between the simulated and experimental results validates the proposed structure.

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More information

Published date: August 2000
Keywords: BREAKDOWN VOLTAGE, PLANAR DEVICES, PLATE
Organisations: Nanoelectronics and Nanotechnology

Identifiers

Local EPrints ID: 263603
URI: http://eprints.soton.ac.uk/id/eprint/263603
ISSN: 0038-1101
PURE UUID: 8f561fd4-fec1-4546-804a-ba965d0fce62

Catalogue record

Date deposited: 23 Feb 2007
Last modified: 18 Jul 2017 07:43

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Contributors

Author: M M De Souza
Author: J V SubhasChandra Bose
Author: E M Sankara Narayanan
Author: T J Pease
Author: G J Ensell
Author: J Humphry

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