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Photoresist patterned thick-film piezoelectric elements on silicon

Photoresist patterned thick-film piezoelectric elements on silicon
Photoresist patterned thick-film piezoelectric elements on silicon
A fundamental limitation of screen printing is the achievable alignment accuracy and resolution. This paper presents details of a thick-resist process that improves both of these factors. The technique involves exposing/developing a thick resist to form the desired pattern and then filling the features with thick film material using a doctor blading process. Registration accuracy comparable with standard photolithographic processes has been achieved resulting in minimum feature sizes of <50 ?m and a film thickness of 100 ?m. Piezoelectric elements have been successfully poled on a platinised silicon wafer with a measured d 33 value of 60 pCN?1.
Frood, A
bdc8ac58-cf0d-48e4-9734-e5185d0b0e86
Beeby, S
ba565001-2812-4300-89f1-fe5a437ecb0d
Tudor, M
46eea408-2246-4aa0-8b44-86169ed601ff
White, N
c7be4c26-e419-4e5c-9420-09fc02e2ac9c
Frood, A
bdc8ac58-cf0d-48e4-9734-e5185d0b0e86
Beeby, S
ba565001-2812-4300-89f1-fe5a437ecb0d
Tudor, M
46eea408-2246-4aa0-8b44-86169ed601ff
White, N
c7be4c26-e419-4e5c-9420-09fc02e2ac9c

Frood, A, Beeby, S, Tudor, M and White, N (2007) Photoresist patterned thick-film piezoelectric elements on silicon. Journal Electroceramics. (doi:10.1007/s10832-007-9049-y).

Record type: Article

Abstract

A fundamental limitation of screen printing is the achievable alignment accuracy and resolution. This paper presents details of a thick-resist process that improves both of these factors. The technique involves exposing/developing a thick resist to form the desired pattern and then filling the features with thick film material using a doctor blading process. Registration accuracy comparable with standard photolithographic processes has been achieved resulting in minimum feature sizes of <50 ?m and a film thickness of 100 ?m. Piezoelectric elements have been successfully poled on a platinised silicon wafer with a measured d 33 value of 60 pCN?1.

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More information

Published date: March 2007
Organisations: EEE

Identifiers

Local EPrints ID: 263759
URI: https://eprints.soton.ac.uk/id/eprint/263759
PURE UUID: bef1438a-ec68-4591-bca1-56e5ed24b651
ORCID for S Beeby: ORCID iD orcid.org/0000-0002-0800-1759
ORCID for N White: ORCID iD orcid.org/0000-0003-1532-6452

Catalogue record

Date deposited: 27 Mar 2007
Last modified: 06 Jun 2018 13:12

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