The University of Southampton
University of Southampton Institutional Repository

Atomic scale simulation of silicon anisotropic chemical etching

Camon, H, Rouhanie, M D, Esteve, D, Gue, A M and Moktadir, Z (1995) Atomic scale simulation of silicon anisotropic chemical etching Microsystem Technologies, 1, pp. 163-167.

Record type: Article

Full text not available from this repository.

More information

Published date: 1995
Organisations: Nanoelectronics and Nanotechnology


Local EPrints ID: 263814
ISSN: 0946-7076
PURE UUID: e4c23531-c898-4abe-a001-be1c2d571dda

Catalogue record

Date deposited: 30 Mar 2007
Last modified: 18 Jul 2017 07:42

Export record


Author: H Camon
Author: M D Rouhanie
Author: D Esteve
Author: A M Gue
Author: Z Moktadir

University divisions

Download statistics

Downloads from ePrints over the past year. Other digital versions may also be available to download e.g. from the publisher's website.

View more statistics

Atom RSS 1.0 RSS 2.0

Contact ePrints Soton:

ePrints Soton supports OAI 2.0 with a base URL of

This repository has been built using EPrints software, developed at the University of Southampton, but available to everyone to use.

We use cookies to ensure that we give you the best experience on our website. If you continue without changing your settings, we will assume that you are happy to receive cookies on the University of Southampton website.