Atomic scale simulation of silicon anisotropic chemical etching


Camon, H, Rouhanie, M D, Esteve, D, Gue, A M and Moktadir, Z (1995) Atomic scale simulation of silicon anisotropic chemical etching Microsystem Technologies, 1, pp. 163-167.

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Item Type: Article
ISSNs: 0946-7076 (print)
Organisations: Nanoelectronics and Nanotechnology
ePrint ID: 263814
Date :
Date Event
1995Published
Date Deposited: 30 Mar 2007
Last Modified: 17 Apr 2017 19:47
Further Information:Google Scholar
URI: http://eprints.soton.ac.uk/id/eprint/263814

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