Moktadir, Z and Sato, K (2000) Instability and Scaling in Si(110) Etched with Tetramethyl Ammonium Hydroxide. Physical chemistry of wet chemical etching of silicon workshop, Toulouse, France. 14 - 16 May 2000.
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Conference or Workshop Item
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Published date: 2000
Additional Information:
Event Dates: May 15-17
Venue - Dates:
Physical chemistry of wet chemical etching of silicon workshop, Toulouse, France, 2000-05-14 - 2000-05-16
Organisations:
Nanoelectronics and Nanotechnology
Identifiers
Local EPrints ID: 263851
URI: http://eprints.soton.ac.uk/id/eprint/263851
PURE UUID: c936d745-7d5e-4d2a-aff7-bf545f24bc32
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Date deposited: 04 Apr 2007
Last modified: 10 Dec 2021 21:40
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Contributors
Author:
Z Moktadir
Author:
K Sato
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