Moktadir, Z and Sato, K (1999) Roughness characterization of Si(110) etched in TMAH by Atomic Force Microscopy. Materials Research society, Boston MA, United States. pp. 305-309 .
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Conference or Workshop Item
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Published date: 1999
Additional Information:
Event Dates: December 1999
Venue - Dates:
Materials Research society, Boston MA, United States, 1999-12-01
Organisations:
Nanoelectronics and Nanotechnology
Identifiers
Local EPrints ID: 263852
URI: http://eprints.soton.ac.uk/id/eprint/263852
PURE UUID: 9cc3ea7a-ec22-4a78-889b-31579ec12185
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Date deposited: 04 Apr 2007
Last modified: 10 Dec 2021 21:40
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Contributors
Author:
Z Moktadir
Author:
K Sato
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