Camon, H, Moktadir, Z and Rouhanie, M D (1998) Atomic scale Monte Carlo simulation of anisotropic etching of silicon. Physical chemistry of wet chemical etching of silicon Workshop, Holten, The, Netherlands. 16 - 18 May 1998.
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Conference or Workshop Item
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Published date: 1998
Additional Information:
Event Dates: May 17-19
Venue - Dates:
Physical chemistry of wet chemical etching of silicon Workshop, Holten, The, Netherlands, 1998-05-16 - 1998-05-18
Organisations:
Nanoelectronics and Nanotechnology
Identifiers
Local EPrints ID: 263853
URI: http://eprints.soton.ac.uk/id/eprint/263853
PURE UUID: d032d656-1493-493d-992b-0fca3e0aee51
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Date deposited: 04 Apr 2007
Last modified: 10 Dec 2021 21:40
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Contributors
Author:
H Camon
Author:
Z Moktadir
Author:
M D Rouhanie
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