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Atomic scale Monte Carlo simulation of anisotropic etching of silicon

Atomic scale Monte Carlo simulation of anisotropic etching of silicon
Atomic scale Monte Carlo simulation of anisotropic etching of silicon
Camon, H
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Moktadir, Z
9e14f4f9-7314-4a39-9776-473806c75dd4
Rouhanie, M D
d2f38691-3fe2-4bed-9631-d452476fd391
Camon, H
0d9898b1-07c7-471b-b8df-fe0d131c49e9
Moktadir, Z
9e14f4f9-7314-4a39-9776-473806c75dd4
Rouhanie, M D
d2f38691-3fe2-4bed-9631-d452476fd391

Camon, H, Moktadir, Z and Rouhanie, M D (1998) Atomic scale Monte Carlo simulation of anisotropic etching of silicon. Physical chemistry of wet chemical etching of silicon Workshop, Netherlands. 17 - 19 May 1998.

Record type: Conference or Workshop Item (Other)

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More information

Published date: 1998
Additional Information: Event Dates: May 17-19
Venue - Dates: Physical chemistry of wet chemical etching of silicon Workshop, Netherlands, 1998-05-17 - 1998-05-19
Organisations: Nanoelectronics and Nanotechnology

Identifiers

Local EPrints ID: 263853
URI: https://eprints.soton.ac.uk/id/eprint/263853
PURE UUID: d032d656-1493-493d-992b-0fca3e0aee51

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Date deposited: 04 Apr 2007
Last modified: 18 Jul 2017 07:42

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Contributors

Author: H Camon
Author: Z Moktadir
Author: M D Rouhanie

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