Nanofabrication of electrode arrays by electron-beam and nanoimprint lithographies
Nanofabrication of electrode arrays by electron-beam and nanoimprint lithographies
The fabrication of ordered nanoelectrode arrays using both electron-beam lithography and nanoimprint lithography is described. Arrays of nanoelectrodes with varying individual electrode diameters were produced and characterised electrochemically. Whilst both methods are highly reproducibile, nanoimprint lithography has the potential to produce devices rapidly and at low-cost. To our knowledge, this is the first report where nanoimprint lithography is employed for the production of nanoelectrode arrays for electroanalytical sensors.
1020-1025
Sandison, Mairi E
58a34899-1348-46e3-95d9-86256e276f9a
Cooper, Jonathan M
dc3a66ac-d235-4c32-bbaf-6b184069418e
June 2006
Sandison, Mairi E
58a34899-1348-46e3-95d9-86256e276f9a
Cooper, Jonathan M
dc3a66ac-d235-4c32-bbaf-6b184069418e
Sandison, Mairi E and Cooper, Jonathan M
(2006)
Nanofabrication of electrode arrays by electron-beam and nanoimprint lithographies.
Lab on a Chip, 6, .
Abstract
The fabrication of ordered nanoelectrode arrays using both electron-beam lithography and nanoimprint lithography is described. Arrays of nanoelectrodes with varying individual electrode diameters were produced and characterised electrochemically. Whilst both methods are highly reproducibile, nanoimprint lithography has the potential to produce devices rapidly and at low-cost. To our knowledge, this is the first report where nanoimprint lithography is employed for the production of nanoelectrode arrays for electroanalytical sensors.
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Published date: June 2006
Organisations:
Nanoelectronics and Nanotechnology
Identifiers
Local EPrints ID: 264535
URI: http://eprints.soton.ac.uk/id/eprint/264535
ISSN: 1473-0197
PURE UUID: 10506529-f82b-4d0f-8a42-18e997b0f177
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Date deposited: 27 Sep 2007
Last modified: 08 Jan 2022 05:46
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Contributors
Author:
Mairi E Sandison
Author:
Jonathan M Cooper
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