Simple approximation for plasma microfield distribution
Simple approximation for plasma microfield distribution
Ionic microfield in plasmas depends strongly on electronic subsystem of plasmas. Two models for electrons influence are examined in this article: 1) uniform neutralizing background of electrons, 2) so-called low-frequency component of microfield. Simple analytic approximations for ionic microfield distribution in these two models are constructed. These approximations are suitable for plasmas with complex composition in wide range of densities and temperatures.
plasma diagnostics, spectral line shape, Stark broadening, electric microfield
1-56396-991-2
179-181
American Institute of Physics
Golosnoy, I.O.
40603f91-7488-49ea-830f-24dd930573d1
2001
Golosnoy, I.O.
40603f91-7488-49ea-830f-24dd930573d1
Golosnoy, I.O.
(2001)
Simple approximation for plasma microfield distribution.
In,
Seidel, J.
(ed.)
Spectral Line Shapes, Vol.11 - 15th International Conference on Spectral Line Shapes.
American Institute of Physics, .
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Abstract
Ionic microfield in plasmas depends strongly on electronic subsystem of plasmas. Two models for electrons influence are examined in this article: 1) uniform neutralizing background of electrons, 2) so-called low-frequency component of microfield. Simple analytic approximations for ionic microfield distribution in these two models are constructed. These approximations are suitable for plasmas with complex composition in wide range of densities and temperatures.
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Published date: 2001
Keywords:
plasma diagnostics, spectral line shape, Stark broadening, electric microfield
Organisations:
EEE
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Local EPrints ID: 264629
URI: http://eprints.soton.ac.uk/id/eprint/264629
ISBN: 1-56396-991-2
PURE UUID: 427500e9-1009-4c53-82d0-0815a7cace16
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Date deposited: 03 Oct 2007
Last modified: 08 Dec 2023 17:53
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Contributors
Author:
I.O. Golosnoy
Editor:
J. Seidel
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