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Characterization of Inductively-Coupled RF Plasma Sources with Multiple Low-Inductance Antenna Units

Characterization of Inductively-Coupled RF Plasma Sources with Multiple Low-Inductance Antenna Units
Characterization of Inductively-Coupled RF Plasma Sources with Multiple Low-Inductance Antenna Units
We have developed a cylindrical RF plasma source by the inductive coupling of multiple low-inductance antenna (LIA) units and analyzed the plasma density profile of this source using fluid simulation. Experiments using four LIA units showed a stable source operation even at 2000 W RF power, attaining plasma densities as high as 1011 – 1012 cm3 in an argon pressure range of 0.67 –2.6 Pa. The amplitude of antenna RF voltage was measured to be less than 600 V, which is considerably smaller than those obtained using conventional ICP antennas. The radial distribution of plasma density sustained using four LIA units showed excellent agreement with profiles numerically predicted using a fluid-simulation code.
0021-4922
8046-8049
Takenaka, Kosuke
e1793c1f-746a-4bf7-a370-13a456a6d27c
Setsuhara, Yuichi
f1d0e0d0-d43b-445b-ad37-3de6a3b755de
Nishikawa, Kazuaki
a25bccd4-685f-4c2c-a3ec-2cdd48b673e0
Ebe, Akinori
0d3569c1-307d-4048-8fff-7b300ad32027
Sugiura, Shinya
4c8665dd-1ad8-4dc0-9298-bf04eded3579
Takahashi, Kazuo
50958ac0-2aa8-4798-95ca-5d941afe29dd
Ono, Koichi
95ba9454-f3e1-430c-84f3-b7adb73aa78e
Takenaka, Kosuke
e1793c1f-746a-4bf7-a370-13a456a6d27c
Setsuhara, Yuichi
f1d0e0d0-d43b-445b-ad37-3de6a3b755de
Nishikawa, Kazuaki
a25bccd4-685f-4c2c-a3ec-2cdd48b673e0
Ebe, Akinori
0d3569c1-307d-4048-8fff-7b300ad32027
Sugiura, Shinya
4c8665dd-1ad8-4dc0-9298-bf04eded3579
Takahashi, Kazuo
50958ac0-2aa8-4798-95ca-5d941afe29dd
Ono, Koichi
95ba9454-f3e1-430c-84f3-b7adb73aa78e

Takenaka, Kosuke, Setsuhara, Yuichi, Nishikawa, Kazuaki, Ebe, Akinori, Sugiura, Shinya, Takahashi, Kazuo and Ono, Koichi (2006) Characterization of Inductively-Coupled RF Plasma Sources with Multiple Low-Inductance Antenna Units. Japanese Journal of Applied Physics, 45 (10B), 8046-8049.

Record type: Article

Abstract

We have developed a cylindrical RF plasma source by the inductive coupling of multiple low-inductance antenna (LIA) units and analyzed the plasma density profile of this source using fluid simulation. Experiments using four LIA units showed a stable source operation even at 2000 W RF power, attaining plasma densities as high as 1011 – 1012 cm3 in an argon pressure range of 0.67 –2.6 Pa. The amplitude of antenna RF voltage was measured to be less than 600 V, which is considerably smaller than those obtained using conventional ICP antennas. The radial distribution of plasma density sustained using four LIA units showed excellent agreement with profiles numerically predicted using a fluid-simulation code.

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More information

Published date: 24 October 2006
Organisations: Electronics & Computer Science

Identifiers

Local EPrints ID: 265204
URI: http://eprints.soton.ac.uk/id/eprint/265204
ISSN: 0021-4922
PURE UUID: 1aba1c98-20a6-441b-8a8d-83ac22278817

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Date deposited: 26 Feb 2008 14:44
Last modified: 07 Jan 2022 23:59

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Contributors

Author: Kosuke Takenaka
Author: Yuichi Setsuhara
Author: Kazuaki Nishikawa
Author: Akinori Ebe
Author: Shinya Sugiura
Author: Kazuo Takahashi
Author: Koichi Ono

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