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Characterization of Inductively-Coupled RF Plasma Sources with Multiple Low-Inductance Antenna Units

Takenaka, Kosuke, Setsuhara, Yuichi, Nishikawa, Kazuaki, Ebe, Akinori, Sugiura, Shinya, Takahashi, Kazuo and Ono, Koichi (2006) Characterization of Inductively-Coupled RF Plasma Sources with Multiple Low-Inductance Antenna Units Japanese Journal of Applied Physics, 45, (10B), pp. 8046-8049.

Record type: Article


We have developed a cylindrical RF plasma source by the inductive coupling of multiple low-inductance antenna (LIA) units and analyzed the plasma density profile of this source using fluid simulation. Experiments using four LIA units showed a stable source operation even at 2000 W RF power, attaining plasma densities as high as 10^{11}–10^{12} cm^3 in an argon pressure range of 0.67 –2.6 Pa. The amplitude of antenna RF voltage was measured to be less than 600 V, which is considerably smaller than those obtained using conventional ICP antennas. The radial distribution of plasma density sustained using four LIA units showed excellent agreement with profiles numerically predicted using a fluid-simulation code.

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Published date: 24 October 2006
Organisations: Electronics & Computer Science


Local EPrints ID: 265204
ISSN: 0021-4922
PURE UUID: 1aba1c98-20a6-441b-8a8d-83ac22278817

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Date deposited: 26 Feb 2008 14:44
Last modified: 18 Jul 2017 07:28

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Author: Kosuke Takenaka
Author: Yuichi Setsuhara
Author: Kazuaki Nishikawa
Author: Akinori Ebe
Author: Shinya Sugiura
Author: Kazuo Takahashi
Author: Koichi Ono

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