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New Design Concept and Fabrication Process for Three-Dimensional Silicon Photonic Crystal Structures

New Design Concept and Fabrication Process for Three-Dimensional Silicon Photonic Crystal Structures
New Design Concept and Fabrication Process for Three-Dimensional Silicon Photonic Crystal Structures
0021-4922
633-637
Hippo, D.
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Urakawa, K.
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Kawata, Y.
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Tsuchiya, Yoshishige
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Mizuta, Hiroshi
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Koshida, N.
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Oda, S.
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Hippo, D.
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Urakawa, K.
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Kawata, Y.
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Tsuchiya, Yoshishige
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Mizuta, Hiroshi
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Koshida, N.
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Oda, S.
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Hippo, D., Urakawa, K., Kawata, Y., Tsuchiya, Yoshishige, Mizuta, Hiroshi, Koshida, N. and Oda, S. (2007) New Design Concept and Fabrication Process for Three-Dimensional Silicon Photonic Crystal Structures. Japanese Journal of Applied Physics, 46, 633-637.

Record type: Article
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More information

Published date: 2007
Organisations: Nanoelectronics and Nanotechnology

Identifiers

Local EPrints ID: 266180
URI: http://eprints.soton.ac.uk/id/eprint/266180
ISSN: 0021-4922
PURE UUID: 656da623-c95c-40f5-bd23-a728c4ee1975

Catalogue record

Date deposited: 21 Jul 2008 15:10
Last modified: 20 Nov 2021 08:28

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Contributors

Author: D. Hippo
Author: K. Urakawa
Author: Y. Kawata
Author: Yoshishige Tsuchiya
Author: Hiroshi Mizuta
Author: N. Koshida
Author: S. Oda

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