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AFM current-imaging study for current density through nanocrystalline silicon dots embedded in SiO2

AFM current-imaging study for current density through nanocrystalline silicon dots embedded in SiO2
AFM current-imaging study for current density through nanocrystalline silicon dots embedded in SiO2
0021-4922
L88-L91
Salem, M. A.
8d5d6e2b-c597-4642-98e7-74fc7f83ce98
Mizuta, Hiroshi
f14d5ffc-751b-472b-8dba-c8518c6840b9
Oda, S.
4a88f225-39f6-4c89-a9da-8c35fbfe6fde
Fu, Y.
c21afbef-67be-4def-9348-c935a6150e83
Willander, M.
3600f53f-431b-4d12-b26a-b20ec217cbd4
Salem, M. A.
8d5d6e2b-c597-4642-98e7-74fc7f83ce98
Mizuta, Hiroshi
f14d5ffc-751b-472b-8dba-c8518c6840b9
Oda, S.
4a88f225-39f6-4c89-a9da-8c35fbfe6fde
Fu, Y.
c21afbef-67be-4def-9348-c935a6150e83
Willander, M.
3600f53f-431b-4d12-b26a-b20ec217cbd4

Salem, M. A., Mizuta, Hiroshi, Oda, S., Fu, Y. and Willander, M. (2005) AFM current-imaging study for current density through nanocrystalline silicon dots embedded in SiO2. Japanese Journal of Applied Physics, 44, L88-L91.

Record type: Article
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More information

Published date: 2005
Organisations: Nanoelectronics and Nanotechnology

Identifiers

Local EPrints ID: 266195
URI: https://eprints.soton.ac.uk/id/eprint/266195
ISSN: 0021-4922
PURE UUID: 27a52d03-ab3d-46ec-a9ae-2466184ea4aa

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Date deposited: 22 Jul 2008 08:08
Last modified: 18 Jul 2017 07:19

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