Atomistic study of phonon states in hydrogen-terminated Si ultra-thin films
Atomistic study of phonon states in hydrogen-terminated Si ultra-thin films
M0200
Sawai, S.
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Uno, S.
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Okamoto, M.
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Tsuchiya, Yoshishige
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Oda, S.
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Mizuta, Hiroshi
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June 2008
Sawai, S.
5a60a3a6-bfa5-4213-8772-d1a19a0c48bf
Uno, S.
ad5d0b8f-4180-46db-b7e8-4d38c4d0bc61
Okamoto, M.
74879bbd-deab-49c0-a3fb-08efe141f28f
Tsuchiya, Yoshishige
5a5178c6-b3a9-4e07-b9b2-9a28e49f1dc2
Oda, S.
4a88f225-39f6-4c89-a9da-8c35fbfe6fde
Mizuta, Hiroshi
f14d5ffc-751b-472b-8dba-c8518c6840b9
Sawai, S., Uno, S., Okamoto, M., Tsuchiya, Yoshishige, Oda, S. and Mizuta, Hiroshi
(2008)
Atomistic study of phonon states in hydrogen-terminated Si ultra-thin films.
IEEE Silicon Nanoelectronics Workshop, Honolulu.
.
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Published date: June 2008
Additional Information:
Event Dates: June 2008
Venue - Dates:
IEEE Silicon Nanoelectronics Workshop, Honolulu, 2008-06-01
Organisations:
Nanoelectronics and Nanotechnology
Identifiers
Local EPrints ID: 266263
URI: http://eprints.soton.ac.uk/id/eprint/266263
PURE UUID: 66102402-12fd-4a65-9916-0974fbd08d2c
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Date deposited: 23 Jul 2008 08:57
Last modified: 14 Mar 2024 08:24
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Contributors
Author:
S. Sawai
Author:
S. Uno
Author:
M. Okamoto
Author:
Yoshishige Tsuchiya
Author:
S. Oda
Author:
Hiroshi Mizuta
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