Fabrication of silicon 3D photonic crystal structures in 100nm scale using double directional etching method
Fabrication of silicon 3D photonic crystal structures in 100nm scale using double directional etching method
114
Hippo, D.
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Kawata, Y.
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Tsuchiya, Yoshishige
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Mizuta, Hiroshi
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Oda, S.
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Urakawa, K.
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Koshida, N.
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May 2006
Hippo, D.
cc10ed6d-7122-4ea4-a116-b81c8dd7c5c3
Kawata, Y.
b09a7d16-5971-4e08-b49f-16a2a1c5b9a2
Tsuchiya, Yoshishige
5a5178c6-b3a9-4e07-b9b2-9a28e49f1dc2
Mizuta, Hiroshi
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Oda, S.
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Urakawa, K.
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Koshida, N.
4dfd7d69-bba7-4a07-b428-97f917dc1a15
Hippo, D., Kawata, Y., Tsuchiya, Yoshishige, Mizuta, Hiroshi, Oda, S., Urakawa, K. and Koshida, N.
(2006)
Fabrication of silicon 3D photonic crystal structures in 100nm scale using double directional etching method.
Conference on lasers and electro-optics / Quantum electronics and laser science conference, Long Beach.
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cpaper_116.pdf
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Published date: May 2006
Additional Information:
Event Dates: May 2006
Venue - Dates:
Conference on lasers and electro-optics / Quantum electronics and laser science conference, Long Beach, 2006-05-01
Organisations:
Nanoelectronics and Nanotechnology
Identifiers
Local EPrints ID: 266298
URI: http://eprints.soton.ac.uk/id/eprint/266298
PURE UUID: f7850304-6d25-4ab9-a294-a617e583fdc9
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Date deposited: 23 Jul 2008 10:33
Last modified: 14 Mar 2024 08:25
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Contributors
Author:
D. Hippo
Author:
Y. Kawata
Author:
Yoshishige Tsuchiya
Author:
Hiroshi Mizuta
Author:
S. Oda
Author:
K. Urakawa
Author:
N. Koshida
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