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Fabrication of silicon 3D photonic crystal structures in 100nm scale using double directional etching method

Fabrication of silicon 3D photonic crystal structures in 100nm scale using double directional etching method
Fabrication of silicon 3D photonic crystal structures in 100nm scale using double directional etching method
114
Hippo, D.
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Kawata, Y.
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Tsuchiya, Yoshishige
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Mizuta, Hiroshi
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Oda, S.
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Urakawa, K.
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Koshida, N.
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Hippo, D.
cc10ed6d-7122-4ea4-a116-b81c8dd7c5c3
Kawata, Y.
b09a7d16-5971-4e08-b49f-16a2a1c5b9a2
Tsuchiya, Yoshishige
5a5178c6-b3a9-4e07-b9b2-9a28e49f1dc2
Mizuta, Hiroshi
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Oda, S.
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Urakawa, K.
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Koshida, N.
4dfd7d69-bba7-4a07-b428-97f917dc1a15

Hippo, D., Kawata, Y., Tsuchiya, Yoshishige, Mizuta, Hiroshi, Oda, S., Urakawa, K. and Koshida, N. (2006) Fabrication of silicon 3D photonic crystal structures in 100nm scale using double directional etching method. Conference on lasers and electro-optics / Quantum electronics and laser science conference, Long Beach. p. 114 .

Record type: Conference or Workshop Item (Other)
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More information

Published date: May 2006
Additional Information: Event Dates: May 2006
Venue - Dates: Conference on lasers and electro-optics / Quantum electronics and laser science conference, Long Beach, 2006-04-30
Organisations: Nanoelectronics and Nanotechnology

Identifiers

Local EPrints ID: 266298
URI: http://eprints.soton.ac.uk/id/eprint/266298
PURE UUID: f7850304-6d25-4ab9-a294-a617e583fdc9

Catalogue record

Date deposited: 23 Jul 2008 10:33
Last modified: 20 Nov 2021 08:33

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Contributors

Author: D. Hippo
Author: Y. Kawata
Author: Yoshishige Tsuchiya
Author: Hiroshi Mizuta
Author: S. Oda
Author: K. Urakawa
Author: N. Koshida

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