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Pr-silicate Ultrathin Films for High-k Gate Dielectrics Prepared by Metal-Organic Chemical Vapor Deposition

Tsuchiya, Yoshishige, Fujita, H., Mizuta, Hiroshi, Nohira, H., Hattori, T. and Oda, S. (2004) Pr-silicate Ultrathin Films for High-k Gate Dielectrics Prepared by Metal-Organic Chemical Vapor Deposition At 2004 TMS Electronic materials conference and exhibition. , p. 30.

Record type: Conference or Workshop Item (Poster)
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More information

Published date: June 2004
Additional Information: Event Dates: June 2004
Venue - Dates: 2004 TMS Electronic materials conference and exhibition, 2004-06-01
Organisations: Nanoelectronics and Nanotechnology

Identifiers

Local EPrints ID: 266335
URI: http://eprints.soton.ac.uk/id/eprint/266335
PURE UUID: 107c5aa2-cadf-4904-a954-8cf1b2cf1543

Catalogue record

Date deposited: 25 Jul 2008 08:27
Last modified: 18 Jul 2017 07:17

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Contributors

Author: Yoshishige Tsuchiya
Author: H. Fujita
Author: Hiroshi Mizuta
Author: H. Nohira
Author: T. Hattori
Author: S. Oda

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