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Pr-silicate Ultrathin Films for High-k Gate Dielectrics Prepared by Metal-Organic Chemical Vapor Deposition

Pr-silicate Ultrathin Films for High-k Gate Dielectrics Prepared by Metal-Organic Chemical Vapor Deposition
Pr-silicate Ultrathin Films for High-k Gate Dielectrics Prepared by Metal-Organic Chemical Vapor Deposition
30
Tsuchiya, Yoshishige
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Fujita, H.
26316f23-b687-4849-875b-3f8180761e1d
Mizuta, Hiroshi
f14d5ffc-751b-472b-8dba-c8518c6840b9
Nohira, H.
79e58176-2227-4989-bf1a-c03f07764e15
Hattori, T.
03686cfe-2164-450c-8a3c-735d1509ac94
Oda, S.
4a88f225-39f6-4c89-a9da-8c35fbfe6fde
Tsuchiya, Yoshishige
5a5178c6-b3a9-4e07-b9b2-9a28e49f1dc2
Fujita, H.
26316f23-b687-4849-875b-3f8180761e1d
Mizuta, Hiroshi
f14d5ffc-751b-472b-8dba-c8518c6840b9
Nohira, H.
79e58176-2227-4989-bf1a-c03f07764e15
Hattori, T.
03686cfe-2164-450c-8a3c-735d1509ac94
Oda, S.
4a88f225-39f6-4c89-a9da-8c35fbfe6fde

Tsuchiya, Yoshishige, Fujita, H., Mizuta, Hiroshi, Nohira, H., Hattori, T. and Oda, S. (2004) Pr-silicate Ultrathin Films for High-k Gate Dielectrics Prepared by Metal-Organic Chemical Vapor Deposition. 2004 TMS Electronic materials conference and exhibition, Notre Dame. p. 30 .

Record type: Conference or Workshop Item (Poster)
Text
cpaper_087.pdf - Other
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More information

Published date: June 2004
Additional Information: Event Dates: June 2004
Venue - Dates: 2004 TMS Electronic materials conference and exhibition, Notre Dame, 2004-05-31
Organisations: Nanoelectronics and Nanotechnology

Identifiers

Local EPrints ID: 266335
URI: http://eprints.soton.ac.uk/id/eprint/266335
PURE UUID: 107c5aa2-cadf-4904-a954-8cf1b2cf1543

Catalogue record

Date deposited: 25 Jul 2008 08:27
Last modified: 20 Nov 2021 08:35

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Contributors

Author: Yoshishige Tsuchiya
Author: H. Fujita
Author: Hiroshi Mizuta
Author: H. Nohira
Author: T. Hattori
Author: S. Oda

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