Tsuchiya, Yoshishige, Fujita, H., Mizuta, Hiroshi, Nohira, H., Hattori, T. and Oda, S. (2004) Pr-silicate Ultrathin Films for High-k Gate Dielectrics Prepared by Metal-Organic Chemical Vapor Deposition. 2004 TMS Electronic materials conference and exhibition, Notre Dame. p. 30 .
Record type:
Conference or Workshop Item
(Poster)
More information
Published date: June 2004
Additional Information:
Event Dates: June 2004
Venue - Dates:
2004 TMS Electronic materials conference and exhibition, Notre Dame, 2004-06-01
Organisations:
Nanoelectronics and Nanotechnology
Identifiers
Local EPrints ID: 266335
URI: http://eprints.soton.ac.uk/id/eprint/266335
PURE UUID: 107c5aa2-cadf-4904-a954-8cf1b2cf1543
Catalogue record
Date deposited: 25 Jul 2008 08:27
Last modified: 14 Mar 2024 08:26
Export record
Contributors
Author:
Yoshishige Tsuchiya
Author:
H. Fujita
Author:
Hiroshi Mizuta
Author:
H. Nohira
Author:
T. Hattori
Author:
S. Oda
Download statistics
Downloads from ePrints over the past year. Other digital versions may also be available to download e.g. from the publisher's website.