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Electron Energy Loss Behavior in Si Quantum Dots Interconnected with Tunnel Oxide Barriers

Uno, S., Mori, N., Nakazato, K., Koshida, N. and Mizuta, Hiroshi (2004) Electron Energy Loss Behavior in Si Quantum Dots Interconnected with Tunnel Oxide Barriers At 2004 Silicon Nanoelectronics Workshop. , pp 121-122.

Record type: Conference or Workshop Item (Poster)
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Published date: June 2004
Additional Information: Event Dates: June 2004
Venue - Dates: 2004 Silicon Nanoelectronics Workshop, 2004-06-01
Organisations: Nanoelectronics and Nanotechnology

Identifiers

Local EPrints ID: 266347
URI: http://eprints.soton.ac.uk/id/eprint/266347
PURE UUID: a738595c-30f0-4d8a-a38b-f06c88a01e2c

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Date deposited: 25 Jul 2008 09:01
Last modified: 18 Jul 2017 07:16

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Contributors

Author: S. Uno
Author: N. Mori
Author: K. Nakazato
Author: N. Koshida
Author: Hiroshi Mizuta

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