Shimada, T., Yamaguchi, S., Ando, M., Nakazato, K., Koshida, N., Takai, K., Tsuchiya, Yoshishige, Mizuta, Hiroshi and Oda, S. (2004) Neosilicon-created new applications. 7th China-Japan Symposium on Thin Films, Chengdu Sichuan. pp 101-104 .
Record type:
Conference or Workshop Item
(Other)
More information
Published date: September 2004
Additional Information:
Event Dates: September 2004
Venue - Dates:
7th China-Japan Symposium on Thin Films, Chengdu Sichuan, 2004-09-01
Organisations:
Nanoelectronics and Nanotechnology
Identifiers
Local EPrints ID: 266389
URI: http://eprints.soton.ac.uk/id/eprint/266389
PURE UUID: 07d4c876-102a-4e7e-8d4e-d6387ccff618
Catalogue record
Date deposited: 28 Jul 2008 08:56
Last modified: 14 Mar 2024 08:27
Export record
Contributors
Author:
T. Shimada
Author:
S. Yamaguchi
Author:
M. Ando
Author:
K. Nakazato
Author:
N. Koshida
Author:
K. Takai
Author:
Yoshishige Tsuchiya
Author:
Hiroshi Mizuta
Author:
S. Oda
Download statistics
Downloads from ePrints over the past year. Other digital versions may also be available to download e.g. from the publisher's website.