Neosilicon-created new applications


Shimada, T., Yamaguchi, S., Ando, M., Nakazato, K., Koshida, N., Takai, K., Tsuchiya, Yoshishige, Mizuta, Hiroshi and Oda, S. (2004) Neosilicon-created new applications At 7th China-Japan Symposium on Thin Films. , pp 101-104.

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Item Type: Conference or Workshop Item (Other)
Additional Information: Event Dates: September 2004
Venue - Dates: 7th China-Japan Symposium on Thin Films, 2004-09-01
Organisations: Nanoelectronics and Nanotechnology
ePrint ID: 266389
Date :
Date Event
September 2004Published
Date Deposited: 28 Jul 2008 08:56
Last Modified: 17 Apr 2017 19:03
Further Information:Google Scholar
URI: http://eprints.soton.ac.uk/id/eprint/266389

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