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Neosilicon-created new applications

Shimada, T., Yamaguchi, S., Ando, M., Nakazato, K., Koshida, N., Takai, K., Tsuchiya, Yoshishige, Mizuta, Hiroshi and Oda, S. (2004) Neosilicon-created new applications At 7th China-Japan Symposium on Thin Films. , pp 101-104.

Record type: Conference or Workshop Item (Other)
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Published date: September 2004
Additional Information: Event Dates: September 2004
Venue - Dates: 7th China-Japan Symposium on Thin Films, 2004-09-01
Organisations: Nanoelectronics and Nanotechnology


Local EPrints ID: 266389
PURE UUID: 07d4c876-102a-4e7e-8d4e-d6387ccff618

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Date deposited: 28 Jul 2008 08:56
Last modified: 18 Jul 2017 07:16

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Author: T. Shimada
Author: S. Yamaguchi
Author: M. Ando
Author: K. Nakazato
Author: N. Koshida
Author: K. Takai
Author: Yoshishige Tsuchiya
Author: Hiroshi Mizuta
Author: S. Oda

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