Simulation of deposition and conductance of discontinuous metallic films
Simulation of deposition and conductance of discontinuous metallic films
Muller, H. -O.
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Boero, M.
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Williams, D.
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Mizuta, Hiroshi
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Inkson, J. C.
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February 1999
Muller, H. -O.
0cde81c2-c635-4e6d-b578-419f228a01d5
Boero, M.
a9eca99d-2b76-4ba6-8e80-e13e7c190bde
Williams, D.
bcbcd58d-a02f-414c-8d2a-b1b05fead720
Mizuta, Hiroshi
f14d5ffc-751b-472b-8dba-c8518c6840b9
Inkson, J. C.
718f70b1-e3ec-40de-927e-aff703d38c76
Muller, H. -O., Boero, M., Williams, D., Mizuta, Hiroshi and Inkson, J. C.
(1999)
Simulation of deposition and conductance of discontinuous metallic films.
3rd Workshop of Advanced Research Initiative in Microelectronics on Nano-Scale Integrated Circuits, Marseille.
Record type:
Conference or Workshop Item
(Poster)
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Published date: February 1999
Additional Information:
Event Dates: February 1999
Venue - Dates:
3rd Workshop of Advanced Research Initiative in Microelectronics on Nano-Scale Integrated Circuits, Marseille, 1999-02-01
Organisations:
Nanoelectronics and Nanotechnology
Identifiers
Local EPrints ID: 266416
URI: http://eprints.soton.ac.uk/id/eprint/266416
PURE UUID: 4fa18f14-8f1e-46bb-bbc2-b7ca6fd184aa
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Date deposited: 30 Jul 2008 09:02
Last modified: 10 Dec 2021 22:17
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Contributors
Author:
H. -O. Muller
Author:
M. Boero
Author:
D. Williams
Author:
Hiroshi Mizuta
Author:
J. C. Inkson
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