Phosphorous-doping in silicon nanocrystals
Phosphorous-doping in silicon nanocrystals
Inaba, N
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Nakamine, Y
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Tsuchiya, Yoshishige
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Mizuta, Hiroshi
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Uchida, K
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Pereira, R
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Stegner, A
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Stutzmann, M
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Oda, S
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September 2008
Inaba, N
0a9613b6-ade8-492b-9ee2-4f3ba25413e8
Nakamine, Y
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Tsuchiya, Yoshishige
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Mizuta, Hiroshi
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Uchida, K
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Pereira, R
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Stegner, A
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Stutzmann, M
cc80ab5b-f5dc-4cc4-848b-e679c7796a1d
Oda, S
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Inaba, N, Nakamine, Y, Tsuchiya, Yoshishige, Mizuta, Hiroshi, Uchida, K, Pereira, R, Stegner, A, Stutzmann, M and Oda, S
(2008)
Phosphorous-doping in silicon nanocrystals.
34th International Conference on Micro & Nano Engineering, , Athens, Greece.
15 - 19 Sep 2008.
Record type:
Conference or Workshop Item
(Other)
Text
cpaper_162.pdf
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Published date: September 2008
Venue - Dates:
34th International Conference on Micro & Nano Engineering, , Athens, Greece, 2008-09-15 - 2008-09-19
Organisations:
Nanoelectronics and Nanotechnology
Identifiers
Local EPrints ID: 266692
URI: http://eprints.soton.ac.uk/id/eprint/266692
PURE UUID: fd83a208-973e-45ce-89d6-f69a17bc5880
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Date deposited: 21 Sep 2008 15:34
Last modified: 14 Mar 2024 08:32
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Contributors
Author:
N Inaba
Author:
Y Nakamine
Author:
Yoshishige Tsuchiya
Author:
Hiroshi Mizuta
Author:
K Uchida
Author:
R Pereira
Author:
A Stegner
Author:
M Stutzmann
Author:
S Oda
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