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Phosphorous-doping in silicon nanocrystals

Phosphorous-doping in silicon nanocrystals
Phosphorous-doping in silicon nanocrystals
Inaba, N
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Nakamine, Y
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Tsuchiya, Yoshishige
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Mizuta, Hiroshi
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Uchida, K
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Pereira, R
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Stegner, A
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Stutzmann, M
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Oda, S
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Inaba, N
0a9613b6-ade8-492b-9ee2-4f3ba25413e8
Nakamine, Y
553b7851-64cf-48b7-bf44-e00573d6ca0f
Tsuchiya, Yoshishige
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Mizuta, Hiroshi
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Uchida, K
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Pereira, R
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Stegner, A
509ba888-6cab-4070-9df8-5929849add5b
Stutzmann, M
cc80ab5b-f5dc-4cc4-848b-e679c7796a1d
Oda, S
514339b3-f8de-4750-8d20-c520834b2477

Inaba, N, Nakamine, Y, Tsuchiya, Yoshishige, Mizuta, Hiroshi, Uchida, K, Pereira, R, Stegner, A, Stutzmann, M and Oda, S (2008) Phosphorous-doping in silicon nanocrystals. 34th International Conference on Micro & Nano Engineering, , Athens, Greece. 15 - 19 Sep 2008.

Record type: Conference or Workshop Item (Other)
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Published date: September 2008
Venue - Dates: 34th International Conference on Micro & Nano Engineering, , Athens, Greece, 2008-09-15 - 2008-09-19
Organisations: Nanoelectronics and Nanotechnology

Identifiers

Local EPrints ID: 266692
URI: http://eprints.soton.ac.uk/id/eprint/266692
PURE UUID: fd83a208-973e-45ce-89d6-f69a17bc5880

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Date deposited: 21 Sep 2008 15:34
Last modified: 14 Mar 2024 08:32

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Contributors

Author: N Inaba
Author: Y Nakamine
Author: Yoshishige Tsuchiya
Author: Hiroshi Mizuta
Author: K Uchida
Author: R Pereira
Author: A Stegner
Author: M Stutzmann
Author: S Oda

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