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Fabrication and simulation of nanostructures for domain wall magnetoresistance studies on nickel

Fabrication and simulation of nanostructures for domain wall magnetoresistance studies on nickel
Fabrication and simulation of nanostructures for domain wall magnetoresistance studies on nickel
We report the use of electron beam lithography and a bilayer lifto® process to fabricate magnetic Ni nanostructures with constriction widths in the range of 22 to 41 nm. The structures fabricated correspond to the nanobridge geometry. Reproducibility and control over the final nanostructure geometry were observed when using the fabrication process introduced, these two qualities are important in order to carry out a more systematic analysis of domain wall magnetoresistance (DWMR). On the other hand, micromagnetic simulations of structures with the nanobridge geometry were carried out using not only the dimensions of the fabricated nanostructures but also smaller dimensions thought to be achievable with further optimization of the fabrication process. It was found that domain walls with a reduced length of 42.5 nm can be obtained using the nanobridge geometry. Furthermore, the anisotropic magnetoresistance (AMR) effect was calculated numerically and it was found to be smaller than the DWMR, this makes the nanobridge geometry a good candidate for future measurements of the magnetoresistive effect due to domain wall scattering.
0304-8853
1467-1470
Claudio Gonzalez, David
c8cf5efd-0857-4860-8931-b46ca75abdfd
Husain, Muhammad Khaled
92db1f76-6760-4cf2-8e30-5d4a602fe15b
de Groot, Kees
92cd2e02-fcc4-43da-8816-c86f966be90c
Bordignon, Giuliano
fac6089a-1557-410a-95c1-106a75bbb722
Fischbacher, Thomas
34c9db48-d571-41af-bdfa-d0db4dd2837f
Fangohr, Hans
2c911050-c8a6-485d-8241-983d46b8edb7
Claudio Gonzalez, David
c8cf5efd-0857-4860-8931-b46ca75abdfd
Husain, Muhammad Khaled
92db1f76-6760-4cf2-8e30-5d4a602fe15b
de Groot, Kees
92cd2e02-fcc4-43da-8816-c86f966be90c
Bordignon, Giuliano
fac6089a-1557-410a-95c1-106a75bbb722
Fischbacher, Thomas
34c9db48-d571-41af-bdfa-d0db4dd2837f
Fangohr, Hans
2c911050-c8a6-485d-8241-983d46b8edb7

Claudio Gonzalez, David, Husain, Muhammad Khaled, de Groot, Kees, Bordignon, Giuliano, Fischbacher, Thomas and Fangohr, Hans (2010) Fabrication and simulation of nanostructures for domain wall magnetoresistance studies on nickel. Journal of Magnetism and Magnetic Materials, 322, 1467-1470. (doi:10.1016/j.jmmm.2009.02.142).

Record type: Article

Abstract

We report the use of electron beam lithography and a bilayer lifto® process to fabricate magnetic Ni nanostructures with constriction widths in the range of 22 to 41 nm. The structures fabricated correspond to the nanobridge geometry. Reproducibility and control over the final nanostructure geometry were observed when using the fabrication process introduced, these two qualities are important in order to carry out a more systematic analysis of domain wall magnetoresistance (DWMR). On the other hand, micromagnetic simulations of structures with the nanobridge geometry were carried out using not only the dimensions of the fabricated nanostructures but also smaller dimensions thought to be achievable with further optimization of the fabrication process. It was found that domain walls with a reduced length of 42.5 nm can be obtained using the nanobridge geometry. Furthermore, the anisotropic magnetoresistance (AMR) effect was calculated numerically and it was found to be smaller than the DWMR, this makes the nanobridge geometry a good candidate for future measurements of the magnetoresistive effect due to domain wall scattering.

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Published date: 2010
Organisations: Nanoelectronics and Nanotechnology

Identifiers

Local EPrints ID: 267214
URI: http://eprints.soton.ac.uk/id/eprint/267214
ISSN: 0304-8853
PURE UUID: 5e12a69c-4e1f-4687-9fc3-50b6b9f3058d
ORCID for Kees de Groot: ORCID iD orcid.org/0000-0002-3850-7101

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Date deposited: 29 Mar 2009 15:25
Last modified: 19 Nov 2019 01:50

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Contributors

Author: David Claudio Gonzalez
Author: Muhammad Khaled Husain
Author: Kees de Groot ORCID iD
Author: Giuliano Bordignon
Author: Thomas Fischbacher
Author: Hans Fangohr

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