Pulsed-Source MOCVD of High-k Dielectric Thin Films with in situ Monitoring by Spectroscopic Ellipsometry
Pulsed-Source MOCVD of High-k Dielectric Thin Films with in situ Monitoring by Spectroscopic Ellipsometry
1957-1961
Tsuchiya, Yoshishige
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Endoh, M
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Kurosawa, M
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Tung, R. T
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Hattori, T
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Oda, S
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April 2003
Tsuchiya, Yoshishige
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Endoh, M
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Kurosawa, M
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Tung, R. T
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Hattori, T
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Oda, S
514339b3-f8de-4750-8d20-c520834b2477
Tsuchiya, Yoshishige, Endoh, M, Kurosawa, M, Tung, R. T, Hattori, T and Oda, S
(2003)
Pulsed-Source MOCVD of High-k Dielectric Thin Films with in situ Monitoring by Spectroscopic Ellipsometry.
Japanese Journal of Applied Physics, 42, .
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Published date: April 2003
Organisations:
Nanoelectronics and Nanotechnology
Identifiers
Local EPrints ID: 267431
URI: http://eprints.soton.ac.uk/id/eprint/267431
ISSN: 0021-4922
PURE UUID: d1ce7124-bef9-4931-8f0b-32b3747c2e59
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Date deposited: 01 Jun 2009 09:11
Last modified: 14 Mar 2024 08:50
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Contributors
Author:
Yoshishige Tsuchiya
Author:
M Endoh
Author:
M Kurosawa
Author:
R. T Tung
Author:
T Hattori
Author:
S Oda
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