Pulsed-source MOCVD HfO2 ultrathin film growth optimized by in situ ellipsometry monitoring
Pulsed-source MOCVD HfO2 ultrathin film growth optimized by in situ ellipsometry monitoring
Tsuchiya, Yoshishige
5a5178c6-b3a9-4e07-b9b2-9a28e49f1dc2
Endoh, M
9c2a7372-1652-4de6-81e8-afd3f1f20c97
Oda, S
514339b3-f8de-4750-8d20-c520834b2477
2003
Tsuchiya, Yoshishige
5a5178c6-b3a9-4e07-b9b2-9a28e49f1dc2
Endoh, M
9c2a7372-1652-4de6-81e8-afd3f1f20c97
Oda, S
514339b3-f8de-4750-8d20-c520834b2477
Tsuchiya, Yoshishige, Endoh, M and Oda, S
(2003)
Pulsed-source MOCVD HfO2 ultrathin film growth optimized by in situ ellipsometry monitoring.
2003 International Conference on Solid State Devices and Materials (SSDM2003), Tokyo, Japan.
16 - 18 Sep 2003.
Record type:
Conference or Workshop Item
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Text
epaper011.pdf
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More information
Published date: 2003
Additional Information:
Event Dates: 16-18 September
Venue - Dates:
2003 International Conference on Solid State Devices and Materials (SSDM2003), Tokyo, Japan, 2003-09-16 - 2003-09-18
Organisations:
Nanoelectronics and Nanotechnology
Identifiers
Local EPrints ID: 267445
URI: http://eprints.soton.ac.uk/id/eprint/267445
PURE UUID: 9cceae00-c5de-4afa-8167-32e1265a44ef
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Date deposited: 01 Jun 2009 15:14
Last modified: 14 Mar 2024 08:50
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Contributors
Author:
Yoshishige Tsuchiya
Author:
M Endoh
Author:
S Oda
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