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Pulsed-source MOCVD HfO2 ultrathin film growth optimized by in situ ellipsometry monitoring

Pulsed-source MOCVD HfO2 ultrathin film growth optimized by in situ ellipsometry monitoring
Pulsed-source MOCVD HfO2 ultrathin film growth optimized by in situ ellipsometry monitoring
Tsuchiya, Yoshishige
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Endoh, M
9c2a7372-1652-4de6-81e8-afd3f1f20c97
Oda, S
514339b3-f8de-4750-8d20-c520834b2477
Tsuchiya, Yoshishige
5a5178c6-b3a9-4e07-b9b2-9a28e49f1dc2
Endoh, M
9c2a7372-1652-4de6-81e8-afd3f1f20c97
Oda, S
514339b3-f8de-4750-8d20-c520834b2477

Tsuchiya, Yoshishige, Endoh, M and Oda, S (2003) Pulsed-source MOCVD HfO2 ultrathin film growth optimized by in situ ellipsometry monitoring. 2003 International Conference on Solid State Devices and Materials (SSDM2003), Tokyo, Japan. 15 - 17 Sep 2003.

Record type: Conference or Workshop Item (Other)
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More information

Published date: 2003
Additional Information: Event Dates: 16-18 September
Venue - Dates: 2003 International Conference on Solid State Devices and Materials (SSDM2003), Tokyo, Japan, 2003-09-15 - 2003-09-17
Organisations: Nanoelectronics and Nanotechnology

Identifiers

Local EPrints ID: 267445
URI: http://eprints.soton.ac.uk/id/eprint/267445
PURE UUID: 9cceae00-c5de-4afa-8167-32e1265a44ef

Catalogue record

Date deposited: 01 Jun 2009 15:14
Last modified: 20 Nov 2021 09:13

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Contributors

Author: Yoshishige Tsuchiya
Author: M Endoh
Author: S Oda

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