Tsuchiya, Yoshishige, Endoh, M, Kurosawa, M, Tung, R. T, Hattori, T and Oda, S (2002) Atomic layer-by-layer MOCVD of high-k dielectric thin films with in-situ monitoring by spectroscopic ellipsometry. 2002 International Conference on Solid State Devices and Materials (SSDM2002), Nagoya, Tokyo. 16 - 18 Sep 2002.
Record type:
Conference or Workshop Item
(Poster)
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Published date: 2002
Additional Information:
Event Dates: 17-19 September
Venue - Dates:
2002 International Conference on Solid State Devices and Materials (SSDM2002), Nagoya, Tokyo, 2002-09-16 - 2002-09-18
Organisations:
Nanoelectronics and Nanotechnology
Identifiers
Local EPrints ID: 267446
URI: http://eprints.soton.ac.uk/id/eprint/267446
PURE UUID: 5610b6fe-2c09-495f-92ae-c84b8847b6d4
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Date deposited: 01 Jun 2009 15:17
Last modified: 10 Dec 2021 22:31
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Contributors
Author:
Yoshishige Tsuchiya
Author:
M Endoh
Author:
M Kurosawa
Author:
R. T Tung
Author:
T Hattori
Author:
S Oda
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