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Atomic layer-by-layer MOCVD of high-k dielectric thin films with in-situ monitoring by spectroscopic ellipsometry

Tsuchiya, Yoshishige, Endoh, M, Kurosawa, M, Tung, R. T, Hattori, T and Oda, S (2002) Atomic layer-by-layer MOCVD of high-k dielectric thin films with in-situ monitoring by spectroscopic ellipsometry At 2002 International Conference on Solid State Devices and Materials (SSDM2002). 17 - 19 Sep 2002.

Record type: Conference or Workshop Item (Poster)

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More information

Published date: 2002
Additional Information: Event Dates: 17-19 September
Venue - Dates: 2002 International Conference on Solid State Devices and Materials (SSDM2002), 2002-09-17 - 2002-09-19
Organisations: Nanoelectronics and Nanotechnology

Identifiers

Local EPrints ID: 267446
URI: http://eprints.soton.ac.uk/id/eprint/267446
PURE UUID: 5610b6fe-2c09-495f-92ae-c84b8847b6d4

Catalogue record

Date deposited: 01 Jun 2009 15:17
Last modified: 18 Jul 2017 07:04

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Contributors

Author: Yoshishige Tsuchiya
Author: M Endoh
Author: M Kurosawa
Author: R. T Tung
Author: T Hattori
Author: S Oda

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