Nanostructured biomimetic moth-eye arrays in silicon by nanoimprint lithography
Nanostructured biomimetic moth-eye arrays in silicon by nanoimprint lithography
The eyes and wings of some species of moth are covered in arrays of subwavelength pillars that have been tuned over millions of years of evolution to reflect as little sunlight as possible. We are investigating ways of exploiting this to reduce reflection from the surfaces of silicon solar cells. Here, we report on the experimental realization of biomimetic antireflective moth-eye arrays in silicon using a technique based on nanoimprint lithography and dry etching. Areas of 1cm x 1cm have been patterned and analysis of reflectance measurements predicts a loss in the performance of a solar cell of only 6.5% compared to an ideal antireflective coating. This compares well with an optimized single layer Si3N4 antireflective coating, for which an 8% loss is predicted.
74010J-1-74010J-12
Boden, S.A.
83976b65-e90f-42d1-9a01-fe9cfc571bf8
Bagnall, D.M.
5d84abc8-77e5-43f7-97cb-e28533f25ef1
August 2009
Boden, S.A.
83976b65-e90f-42d1-9a01-fe9cfc571bf8
Bagnall, D.M.
5d84abc8-77e5-43f7-97cb-e28533f25ef1
Boden, S.A. and Bagnall, D.M.
(2009)
Nanostructured biomimetic moth-eye arrays in silicon by nanoimprint lithography.
SPIE Optics and Photonics 2009, San Diego.
.
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Conference or Workshop Item
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Abstract
The eyes and wings of some species of moth are covered in arrays of subwavelength pillars that have been tuned over millions of years of evolution to reflect as little sunlight as possible. We are investigating ways of exploiting this to reduce reflection from the surfaces of silicon solar cells. Here, we report on the experimental realization of biomimetic antireflective moth-eye arrays in silicon using a technique based on nanoimprint lithography and dry etching. Areas of 1cm x 1cm have been patterned and analysis of reflectance measurements predicts a loss in the performance of a solar cell of only 6.5% compared to an ideal antireflective coating. This compares well with an optimized single layer Si3N4 antireflective coating, for which an 8% loss is predicted.
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Published date: August 2009
Additional Information:
Event Dates: 2/8/2009
Venue - Dates:
SPIE Optics and Photonics 2009, San Diego, 2009-08-02
Organisations:
Nanoelectronics and Nanotechnology
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Local EPrints ID: 267800
URI: http://eprints.soton.ac.uk/id/eprint/267800
PURE UUID: f8a06161-5a79-47a7-8f02-5297e5b15a73
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Date deposited: 25 Aug 2009 14:22
Last modified: 15 Mar 2024 03:21
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Contributors
Author:
S.A. Boden
Author:
D.M. Bagnall
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