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Hybrid Circuit Analysis of a Suspended Gate Silicon Nanodot Memory (SGSNM) cell

Garcia Ramirez, Mario, Tsuchiya, Yoshishige and Mizuta, Hiroshi (2009) Hybrid Circuit Analysis of a Suspended Gate Silicon Nanodot Memory (SGSNM) cell Microelectronic Engineering, 87, pp. 1284-1286.

Record type: Article


We report a hybrid numerical analysis of the suspended gate silicon nanodot memory (SGSNM) which co-integrates nano-electromechanical systems (NEMS) with silicon MOSFET technology. We propose a new hybrid equivalent circuit model for the SGSNM, in which a parallel-connected variable gate capacitance and variable tunnel resistance model the suspended gate pull-in/pull-out operation and the electron tunnelling process through the tunnelling oxide layer. The signals for the programming, erasing and reading processes are successfully achieved in the circuit level simulation. The programming/erasing speed is found 2.5 ns which is a combination between the mechanical SG pull-in (0.8 ns) and the tunnelling process (1.7 ns). Those characteristics and the fact that the SGSNM does not use exotic materials but Si-based materials, makes the SGSNM a serious candidate for non-volatile random access memory applications.

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Published date: 22 November 2009
Keywords: hybrid analysis, CMOS-NEMS, Non-volatile memories, Non-Volatile RAM
Organisations: Nanoelectronics and Nanotechnology


Local EPrints ID: 268271
ISSN: 0167-9317
PURE UUID: f9df4368-b04b-44d9-901a-5d34df4ab5d9

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Date deposited: 27 Nov 2009 10:09
Last modified: 18 Jul 2017 06:55

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Author: Mario Garcia Ramirez
Author: Yoshishige Tsuchiya
Author: Hiroshi Mizuta

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