Performance improvement of a vibration-powered electromagnetic generator by reduced silicon surface roughness
Performance improvement of a vibration-powered electromagnetic generator by reduced silicon surface roughness
This paper reports on a chemical polishing process suitable for p-type medium to high resistivity (17-33 Ωcm) silicon substrates. The chemical polishing process using an HNA solution of ratio 27:43:30 (hydrofluoric, fuming nitric, and acetic acids respectively). The process has been applied to the fabrication of a micromachined electromagnetic generator to reduce the sidewall surface roughness of the device after Deep Reactive Ion Etching (DRIE). The microgenerator converts external ambient vibration into electrical energy by electromagnetic transduction. Power output is limited by the maximum amplitude of movement which is in turn limited by the fracture strength of the etched silicon. By applying the polishing etch to the devices, the mechanical strength of the silicon structures increased from 2 N to 5.5 N (similar to 175% increase).
651-654
Koukharenko, E.
b34ae878-2776-4088-8880-5b2bd4f33ec3
Tudor, M.J.
46eea408-2246-4aa0-8b44-86169ed601ff
Beeby, SP
ba565001-2812-4300-89f1-fe5a437ecb0d
29 February 2008
Koukharenko, E.
b34ae878-2776-4088-8880-5b2bd4f33ec3
Tudor, M.J.
46eea408-2246-4aa0-8b44-86169ed601ff
Beeby, SP
ba565001-2812-4300-89f1-fe5a437ecb0d
Koukharenko, E., Tudor, M.J. and Beeby, SP
(2008)
Performance improvement of a vibration-powered electromagnetic generator by reduced silicon surface roughness.
Materials Letters, 62 (4-5), .
(doi:10.1016/j.matlet.2007.06.050).
Abstract
This paper reports on a chemical polishing process suitable for p-type medium to high resistivity (17-33 Ωcm) silicon substrates. The chemical polishing process using an HNA solution of ratio 27:43:30 (hydrofluoric, fuming nitric, and acetic acids respectively). The process has been applied to the fabrication of a micromachined electromagnetic generator to reduce the sidewall surface roughness of the device after Deep Reactive Ion Etching (DRIE). The microgenerator converts external ambient vibration into electrical energy by electromagnetic transduction. Power output is limited by the maximum amplitude of movement which is in turn limited by the fracture strength of the etched silicon. By applying the polishing etch to the devices, the mechanical strength of the silicon structures increased from 2 N to 5.5 N (similar to 175% increase).
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e-pub ahead of print date: 26 June 2007
Published date: 29 February 2008
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Copyright © 2007 Elsevier B.V. All rights reserved.
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Local EPrints ID: 269124
URI: http://eprints.soton.ac.uk/id/eprint/269124
PURE UUID: ff6dd974-30c2-4699-9360-859302fcdb3d
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Date deposited: 21 Apr 2010 07:46
Last modified: 15 Mar 2024 02:46
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Author:
E. Koukharenko
Author:
M.J. Tudor
Author:
SP Beeby
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