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Performance improvement of a vibration-powered electromagnetic generator by reduced silicon surface roughness

Record type: Article

This paper reports on a chemical polishing process suitable for p-type medium to high resistivity (17-33 Omega cm) silicon substrates. The chemical polishing process using an HNA solution of ratio 27:43:30 (hydrofluoric, fuming nitric, and acetic acids respectively). The process has been applied to the fabrication of a micromachined electromagnetic generator to reduce the sidewall surface roughness of the device after Deep Reactive Ion Etching (DRIE). The microgenerator converts external ambient vibration into electrical energy by electromagnetic transduction. Power output is limited by the maximum amplitude of movement which is in turn limited by the fracture strength of the etched silicon. By applying the polishing etch to the devices, the mechanical strength of the silicon structures increased from 2 N to 5.5 N (similar to 175% increase). (C) 2007 Elsevier B.V. All rights reserved.

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Citation

Koukharenko, E, Tudor, W and Beeby, SP (2008) Performance improvement of a vibration-powered electromagnetic generator by reduced silicon surface roughness MATERIALS LETTERS, 62, pp. 651-654.

More information

Published date: 2008
Additional Information: Imported from ISI Web of Science
Organisations: EEE

Identifiers

Local EPrints ID: 269124
URI: http://eprints.soton.ac.uk/id/eprint/269124
PURE UUID: ff6dd974-30c2-4699-9360-859302fcdb3d
ORCID for SP Beeby: ORCID iD orcid.org/0000-0002-0800-1759

Catalogue record

Date deposited: 21 Apr 2010 07:46
Last modified: 18 Jul 2017 06:51

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Contributors

Author: E Koukharenko
Author: W Tudor
Author: SP Beeby ORCID iD

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