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Performance improvement of a vibration-powered electromagnetic generator by reduced silicon surface roughness

Performance improvement of a vibration-powered electromagnetic generator by reduced silicon surface roughness
Performance improvement of a vibration-powered electromagnetic generator by reduced silicon surface roughness
This paper reports on a chemical polishing process suitable for p-type medium to high resistivity (17-33 Ωcm) silicon substrates. The chemical polishing process using an HNA solution of ratio 27:43:30 (hydrofluoric, fuming nitric, and acetic acids respectively). The process has been applied to the fabrication of a micromachined electromagnetic generator to reduce the sidewall surface roughness of the device after Deep Reactive Ion Etching (DRIE). The microgenerator converts external ambient vibration into electrical energy by electromagnetic transduction. Power output is limited by the maximum amplitude of movement which is in turn limited by the fracture strength of the etched silicon. By applying the polishing etch to the devices, the mechanical strength of the silicon structures increased from 2 N to 5.5 N (similar to 175% increase).
651-654
Koukharenko, E.
b34ae878-2776-4088-8880-5b2bd4f33ec3
Tudor, M.J.
46eea408-2246-4aa0-8b44-86169ed601ff
Beeby, SP
ba565001-2812-4300-89f1-fe5a437ecb0d
Koukharenko, E.
b34ae878-2776-4088-8880-5b2bd4f33ec3
Tudor, M.J.
46eea408-2246-4aa0-8b44-86169ed601ff
Beeby, SP
ba565001-2812-4300-89f1-fe5a437ecb0d

Koukharenko, E., Tudor, M.J. and Beeby, SP (2008) Performance improvement of a vibration-powered electromagnetic generator by reduced silicon surface roughness. Materials Letters, 62 (4-5), 651-654. (doi:10.1016/j.matlet.2007.06.050).

Record type: Article

Abstract

This paper reports on a chemical polishing process suitable for p-type medium to high resistivity (17-33 Ωcm) silicon substrates. The chemical polishing process using an HNA solution of ratio 27:43:30 (hydrofluoric, fuming nitric, and acetic acids respectively). The process has been applied to the fabrication of a micromachined electromagnetic generator to reduce the sidewall surface roughness of the device after Deep Reactive Ion Etching (DRIE). The microgenerator converts external ambient vibration into electrical energy by electromagnetic transduction. Power output is limited by the maximum amplitude of movement which is in turn limited by the fracture strength of the etched silicon. By applying the polishing etch to the devices, the mechanical strength of the silicon structures increased from 2 N to 5.5 N (similar to 175% increase).

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More information

e-pub ahead of print date: 26 June 2007
Published date: 29 February 2008
Additional Information: Copyright © 2007 Elsevier B.V. All rights reserved.
Organisations: EEE

Identifiers

Local EPrints ID: 269124
URI: http://eprints.soton.ac.uk/id/eprint/269124
PURE UUID: ff6dd974-30c2-4699-9360-859302fcdb3d
ORCID for M.J. Tudor: ORCID iD orcid.org/0000-0003-1179-9455
ORCID for SP Beeby: ORCID iD orcid.org/0000-0002-0800-1759

Catalogue record

Date deposited: 21 Apr 2010 07:46
Last modified: 09 Aug 2022 17:01

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Contributors

Author: E. Koukharenko
Author: M.J. Tudor ORCID iD
Author: SP Beeby ORCID iD

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